Touch Apparatus, Transparent Scan Electrode Structure, and Manufacturing Method Thereof
First Claim
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1. A transparent scan electrode structure, comprising:
- a first transparent scan electrode, comprising;
a first resistance region; and
a second resistance region, wherein a resistance value of the second resistance region is higher than that of the first resistance region;
a second transparent scan electrode; and
an isolative layer disposed between the first transparent scan electrode and the second transparent scan electrode.
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Abstract
A touch apparatus, a transparent scan electrode, a geometric electrode structure and a manufacturing method thereof are disclosed. The transparent scan electrode structure comprises a first transparent scan electrode, a second transparent scan electrode and an isolative layer. The first transparent scan electrode comprises a first resistance region and a second resistance region. A resistance value of the second resistance region is higher than that of the first resistance region. The isolative layer is disposed between the first transparent scan electrode and the second transparent scan electrode.
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Citations
52 Claims
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1. A transparent scan electrode structure, comprising:
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a first transparent scan electrode, comprising; a first resistance region; and a second resistance region, wherein a resistance value of the second resistance region is higher than that of the first resistance region; a second transparent scan electrode; and an isolative layer disposed between the first transparent scan electrode and the second transparent scan electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A touch apparatus, comprising:
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a touch panel, comprising; a plurality of first transparent scan electrodes, each comprising; a first resistance region; a second resistance region, wherein a resistance value of the second resistance region is higher than that of the first resistance region; a plurality of second transparent scan electrodes; and an isolative layer disposed between the first transparent scan electrodes and the second transparent scan electrodes; and a processing unit for sequentially scanning and driving the first transparent scan electrodes and the second transparent scan electrodes, wherein the first transparent scan electrodes being driven are set in a high level output state, the first transparent scan electrodes not being driven are set in a low level output state, the second transparent scan electrodes being driven are in a high impedance input state, and the second transparent scan electrodes not being driven are set in a low level output state. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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36. A manufacturing method of a transparent scan electrode structure, comprising:
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forming a first transparent scan electrode on a first substrate, wherein the first transparent scan electrode comprises a first resistance region and a second resistance region, and a resistance value of the second resistance region is higher than that of the first resistance region; forming a second transparent scan electrode on a second substrate; forming an isolative layer on the first substrate; and vertically aligning and combining the first substrate and the second substrate are. - View Dependent Claims (37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52)
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Specification