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PLASMA PROCESSING APPARATUS

  • US 20110146910A1
  • Filed: 06/05/2009
  • Published: 06/23/2011
  • Est. Priority Date: 06/11/2008
  • Status: Abandoned Application
First Claim
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1. A plasma processing apparatus comprising a processing container which is formed of metal and receives a substrate to be plasma-processed, an electromagnetic wave source which supplies an electromagnetic wave required to excite plasma in the processing container, and a plurality of dielectrics, through which the electromagnetic wave supplied from the electromagnetic wave source transmits to the inside of the processing container and which have a part that is exposed to the inside of the processing container, provided on a lower surface of a lid of the processing container,wherein a metal electrode is provided on a lower surface of each of the dielectrics, andwherein a surface wave propagating portion, through which the electromagnetic wave is propagated, is formed on each of two different sides of such part of each dielectric that is exposed between the metal electrode and the lower surface of the lid, and the surface wave propagating portion on said two different sides have the substantially similar shapes as each other or the substantially symmetrical shapes to each other.

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