Charged balanced devices with shielded gate trench
First Claim
1. A semiconductor power device comprising:
- a semiconductor substrate including a plurality of deep trenches;
an epitaxial layer filling said deep trenches, the epitaxial layer further including a simultaneously grown top epitaxial layer covering areas above a top surface of said deep trenches and over said semiconductor substrate, wherein the epitaxial layer is of an opposite conductivity type as the semiconductor substrate;
a plurality of trench MOSFET cells disposed in said top epitaxial layer with the top epitaxial layer acting as the body region and the semiconductor substrate acting as the drain region whereby a super-junction effect is achieved through charge balance between the epitaxial layer in the deep trenches and regions in the semiconductor substrate laterally adjacent to the deep trenches; and
each of said plurality of trench MOSFET cells further including a trench gate and a gate-shielding dopant region disposed below and substantially aligned with each of the trench gates for each of the trench MOSFET cells for shielding the trench gate during a voltage breakdown, wherein the gate-shielding dopant region has an opposite conductivity type as the substrate; and
a gate-bottom dopant implant-region disposed below each of the trench gates implanted with a dopant having a same conductivity type as the substrate and are located above the gate-shielding dopant regions.
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Accused Products
Abstract
This invention discloses a semiconductor power device disposed on a semiconductor substrate includes a plurality of deep trenches with an epitaxial layer filling said deep trenches and a simultaneously grown top epitaxial layer covering areas above a top surface of said deep trenches over the semiconductor substrate. A plurality of trench MOSFET cells disposed in said top epitaxial layer with the top epitaxial layer functioning as the body region and the semiconductor substrate acting as the drain region whereby a super-junction effect is achieved through charge balance between the epitaxial layer in the deep trenches and regions in the semiconductor substrate laterally adjacent to the deep trenches. Each of the trench MOSFET cells further includes a trench gate and a gate-shielding dopant region disposed below and substantially aligned with each of the trench gates for each of the trench MOSFET cells for shielding the trench gate during a voltage breakdown.
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Citations
15 Claims
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1. A semiconductor power device comprising:
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a semiconductor substrate including a plurality of deep trenches; an epitaxial layer filling said deep trenches, the epitaxial layer further including a simultaneously grown top epitaxial layer covering areas above a top surface of said deep trenches and over said semiconductor substrate, wherein the epitaxial layer is of an opposite conductivity type as the semiconductor substrate; a plurality of trench MOSFET cells disposed in said top epitaxial layer with the top epitaxial layer acting as the body region and the semiconductor substrate acting as the drain region whereby a super-junction effect is achieved through charge balance between the epitaxial layer in the deep trenches and regions in the semiconductor substrate laterally adjacent to the deep trenches; and each of said plurality of trench MOSFET cells further including a trench gate and a gate-shielding dopant region disposed below and substantially aligned with each of the trench gates for each of the trench MOSFET cells for shielding the trench gate during a voltage breakdown, wherein the gate-shielding dopant region has an opposite conductivity type as the substrate; and a gate-bottom dopant implant-region disposed below each of the trench gates implanted with a dopant having a same conductivity type as the substrate and are located above the gate-shielding dopant regions. - View Dependent Claims (3, 4)
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2. A semiconductor power device comprising:
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a semiconductor substrate including a plurality of deep trenches; an epitaxial layer filling said deep trenches, the epitaxial layer further including a simultaneously grown top epitaxial layer covering areas above a top surface of said deep trenches and over said semiconductor substrate, wherein the epitaxial layer is of an opposite conductivity type as the semiconductor substrate; a plurality of trench MOSFET cells disposed in said top epitaxial layer with the top epitaxial layer acting as the body region and the semiconductor substrate acting as the drain region whereby a super-junction effect is achieved through charge balance between the epitaxial layer in the deep trenches and regions in the semiconductor substrate laterally adjacent to the deep trenches; and said trench gate further comprising gate sidewall dopant regions surrounding sidewalls of said trench gate and a gate-bottom dopant region below said trench gate, wherein the gate sidewall dopant regions and gate-bottom dopant regions are of the same conductivity type as the semiconductor substrate.
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5. A semiconductor power device comprising:
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a semiconductor substrate including deep trenches; a single epitaxial layer which fills the deep trenches and covers the top surface of the semiconductor substrate; and a plurality of trench MOSFET cells formed in the top portion of the epitaxial layer over the semiconductor surface, wherein the portion of the semiconductor substrate lateral to the deep trenches functioning as a drift layer of the trench MOSFET cells and wherein trench gates of said trench MOSFET cells are formed in the portions of the epitaxial layer over the drift region between the deep trenches, and wherein the semiconductor power device achieves a super-junction effect through charge-balance between the drift region and the portion of the epitaxial layer in the deep trenches; and a gate-shielding dopant region disposed below and substantially aligned with each of the trench gates for each of the trench MOSFET cells for shielding the trench gate during a voltage breakdown. - View Dependent Claims (6)
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7. A method for forming a semiconductor power device on a semiconductor substrate comprising:
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providing a semiconductor substrate; opening a plurality of deep trenches in the semiconductor substrate and growing an epitaxial layer that fills said deep trenches and covers a top surface of said semiconductor substrate with a top epitaxial layer, wherein the portions of the epitaxial layer in the epitaxial deep trench and said top epitaxial layer are simultaneously grown as a single layer and wherein the epitaxial layer is of an opposite conductivity type as the semiconductor substrate; and forming a plurality of trench MOSFET cells in said top epitaxial layer by opening a plurality of trench gates and implanting a plurality of gate-shielding dopant regions below said gate trenches for shielding trench gates of said transistor cells during a voltage breakdown of said semiconductor power device with the top epitaxial layer acting as the body region and the semiconductor substrate acting as the drain region, wherein a super-junction effect is achieved through charge balance between the portions of the epitaxial layer in the deep trenches and the portions of the semiconductor substrate lateral to the deep trenches. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15)
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Specification