Method for Controlling the Position of a Movable Object, a Control System for Controlling a Positioning Device, and a Lithographic Apparatus
First Claim
1. A control system for controlling a positioning device displaceable in a degree of freedom via at least one reluctance motor, the control system comprising:
- at least one force sensing element, each force sensing element configured to sense an amount of force applied by a corresponding reluctance motor; and
a controller configured to adjust the amount of force applied by the corresponding reluctance motor based on output from a corresponding force sensing element.
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Accused Products
Abstract
A control system controls a positioning device displaceable in at least one degree of freedom by a reluctance motor. A force sensing element and a controller adjust force applied by the motor responsive to a force sensing element configured to sense force applied by the motor. The controller receives a signal representing force applied by the motor from the force sensing element, obtain an acceleration trajectory plan associated with a velocity trajectory plan for the positioning device, obtain a force trajectory plan associated with the acceleration trajectory plan, compare the force applied with a required amount of force obtained from the force trajectory, and adjust the amount of force applied by the motor based on the comparison. Related methods are also presented.
23 Citations
20 Claims
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1. A control system for controlling a positioning device displaceable in a degree of freedom via at least one reluctance motor, the control system comprising:
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at least one force sensing element, each force sensing element configured to sense an amount of force applied by a corresponding reluctance motor; and a controller configured to adjust the amount of force applied by the corresponding reluctance motor based on output from a corresponding force sensing element. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A lithography apparatus comprising:
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an illumination system configured to condition a radiation beam; a patterning device stage constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate stage constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a positioning system configured to control a position of a short stroke module configured to hold one of the substrate or the patterning device in at least a first degree of freedom, the positioning system including a first motor assembly including one or more reluctance motors configured to move the short stroke module in the first degree of freedom; a second motor assembly including one or more motors of a second type configured to move the short stroke module in the first degree of freedom; and a control system for controlling at least the first motor assembly, the control system including at least one force sensing element, each force sensing element configured to sense an amount of force applied by a corresponding reluctance motor; and a controller configured to adjust the amount of force applied by the corresponding reluctance motor based on output from a corresponding force sensing element. - View Dependent Claims (10, 11, 12)
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13. A method of positioning a movable object in a first degree of freedom, the method comprising:
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providing a motor assembly including one or more reluctance motors configured to accelerate the movable object in the first degree of freedom; providing at least one feedback signal representative of an amount of force applied by the motor assembly; and providing at least one control signal to adjust the amount of force applied by the motor assembly based on the at least one feedback signal. - View Dependent Claims (14, 15, 16, 17)
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18. A method of positioning a short stroke stage of a lithographic apparatus in a first degree of freedom, the method comprising:
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providing a motor assembly including one or more reluctance motors configured to accelerate the short stroke stage in the first degree of freedom, each reluctance motor having a core coupled to a long stroke stage associated with the short stroke stage, a flux earlier bar coupled to the short stroke stage, and a gap between the core and the flux carrier bar; and adjusting a size of the gap in accordance with respective movement events of the short stroke stage to minimize parasitic effects of a corresponding reluctance motor. - View Dependent Claims (19)
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20. A method of positioning a short stroke stage of a lithographic apparatus in a first degree of freedom, the method comprising:
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accelerating the short stroke stage in a first direction with one or more reluctance motors at a first end of the short stroke stage and one or more additional motors of another type; driving the short stroke stage at an approximately constant velocity in the first direction with the one or more additional motors; accelerating the short stroke stage in a second direction opposite the first direction with one or more reluctance motors at a second end of the short stroke stage and the one or more additional motors; driving the short stroke stage at an approximately constant velocity in the second direction with the one or more additional motors; and adjusting respective amounts of force applied by the one or more reluctance motors at the first and second ends of the short stroke stage as needed based on output from one or more feedback sensors, each feedback sensor configured to sense an amount of force applied by a corresponding one of the one or more reluctance motors.
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Specification