METHOD OF PRODUCING AN INTEGRATED MICROMAGNET SENSOR ASSEMBLY
First Claim
1. A method of integrating a permanent bias magnet within a magnetoresistance sensor comprising:
- depositing an alternating pattern of a metal material and a semiconductor material on or within a surface of an insulating substrate;
depositing a mask on the surface of the insulating substrate to create an opening above the alternating pattern of metal material and semiconductor material;
applying a magnetic paste within the opening above the alternating pattern of metal material and semiconductor material;
curing the magnetic paste to form a hardened bias magnet;
removing the mask; and
magnetizing the hardened bias magnet by applying a strong magnetic field to the hardened bias magnet at a desired orientation.
4 Assignments
0 Petitions
Accused Products
Abstract
A method of integrating a permanent bias magnet within a magnetoresistance sensor comprising depositing an alternating pattern of a metal material and a semiconductor material on or within a surface of an insulating substrate; depositing a mask on the surface of the insulating substrate to create an opening above the alternating pattern of metal material and semiconductor material; applying a magnetic paste within the opening above the alternating pattern of metal material and semiconductor material; curing the magnetic paste to form a hardened bias magnet; removing the mask; and magnetizing the hardened bias magnet by applying a strong magnetic field to the hardened bias magnet at a desired orientation.
38 Citations
16 Claims
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1. A method of integrating a permanent bias magnet within a magnetoresistance sensor comprising:
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depositing an alternating pattern of a metal material and a semiconductor material on or within a surface of an insulating substrate; depositing a mask on the surface of the insulating substrate to create an opening above the alternating pattern of metal material and semiconductor material; applying a magnetic paste within the opening above the alternating pattern of metal material and semiconductor material; curing the magnetic paste to form a hardened bias magnet; removing the mask; and magnetizing the hardened bias magnet by applying a strong magnetic field to the hardened bias magnet at a desired orientation. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method of producing an integrated magnetoresistance sensor assembly including a permanent bias magnet comprising:
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depositing an alternating pattern of a metal material and a semiconductor material on or within a surface of an insulating substrate; depositing a photoresist mask on the surface of the insulating substrate in a pattern that covers the surface of the insulating substrate, but leaves an opening above the alternating pattern of metal material and semiconductor material; applying a magnetic paste over the photoresist mask and the opening above the alternating pattern of metal material and semiconductor material; removing the magnetic paste from above the photoresist mask, but leaving the magnetic paste within the opening above the alternating pattern of metal material and semiconductor material; curing the magnetic paste within the opening above the alternating pattern of metal material and semiconductor material to form a hardened bias magnet; removing the photoresist mask from around the hardened bias magnet; and applying a strong magnetic field to the hardened bias magnet at a desired orientation to magnetize the hardened bias magnet. - View Dependent Claims (12, 13, 14, 15, 16)
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Specification