METHOD FOR FABRICATING COLOR FILTER USING SURFACE PLASMON AND METHOD FOR FABRICATING LIQUID CRYSTAL DISPLAY DEVICE
First Claim
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1. A method for fabricating a color filter using a surface plasmon, the method comprising:
- forming a metallic film formed of a conductive material on a substrate;
forming, on the metallic film, a dielectric layer formed of a dielectric material having a refractive index equal to or similar to that of the substrate;
forming a predetermined photosensitive pattern on the substrate having the dielectric layer formed thereon;
forming, below the predetermined photosensitive pattern, a dielectric pattern formed of the dielectric material, by selectively removing the dielectric layer by using the photosensitive pattern as a mask;
forming, in a metal layer formed of the metallic film, a transmissive pattern consisting of a plurality of sub-wavelength holes having a period, by selectively removing the metal layer by using the photosensitive pattern as a mask; and
forming, on the metal layer including the transmissive pattern, an insulating layer formed of the same material as the dielectric material.
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Abstract
Discussed are methods for fabricating a color filter using a surface plasmon and a liquid crystal display (LCD) device capable of enhancing a transmittance ratio of an LC panel and simplifying entire processes, by forming a transmissive pattern consisting of a plurality of sub-wavelength holes having a period on a metal layer, and by implementing colors by selectively transmitting light of specific wavelengths with using a surface plasmon phenomenon.
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Citations
25 Claims
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1. A method for fabricating a color filter using a surface plasmon, the method comprising:
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forming a metallic film formed of a conductive material on a substrate; forming, on the metallic film, a dielectric layer formed of a dielectric material having a refractive index equal to or similar to that of the substrate; forming a predetermined photosensitive pattern on the substrate having the dielectric layer formed thereon; forming, below the predetermined photosensitive pattern, a dielectric pattern formed of the dielectric material, by selectively removing the dielectric layer by using the photosensitive pattern as a mask; forming, in a metal layer formed of the metallic film, a transmissive pattern consisting of a plurality of sub-wavelength holes having a period, by selectively removing the metal layer by using the photosensitive pattern as a mask; and forming, on the metal layer including the transmissive pattern, an insulating layer formed of the same material as the dielectric material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method for fabricating a liquid crystal display (LCD) device, the method comprising:
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providing a first substrate and a second substrate; forming a metallic film formed of a conductive material on the first substrate; forming, on the metallic film, a dielectric layer formed of a dielectric material having a refractive index equal to or similar to that of the first substrate; forming a predetermined photosensitive pattern on the first substrate having the dielectric layer formed thereon; forming, below the predetermined photosensitive pattern, a dielectric pattern formed of the dielectric material, by selectively removing the dielectric layer by using the photosensitive pattern as a mask; forming, in a metal layer formed of the metallic film, a transmissive pattern consisting of a plurality of sub-wavelength holes having a period, by selectively removing the metal layer by using the photosensitive pattern as a mask; forming, on the metal layer including the transmissive pattern, an insulating layer formed of the same material as the dielectric material; forming a thin film transistor on the insulating layer; and bonding the first and second substrates to each other, wherein the second substrate has no color filter and black matrix formed thereon. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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12. A method for fabricating a liquid crystal display (LCD) device, the method comprising:
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providing a first substrate and a second substrate; forming a metallic film formed of a conductive material on an external surface of the first substrate; forming, on the metallic film, a dielectric layer formed of a dielectric material having a refractive index equal to or similar to that of the first substrate; forming a predetermined photosensitive pattern on the first substrate having the dielectric layer formed thereon; forming, below the predetermined photosensitive pattern, a dielectric pattern formed of the dielectric material, by selectively removing the dielectric layer by using the photosensitive pattern as a mask; forming, in a metal layer formed of the metallic layer, a transmissive pattern consisting of a plurality of sub-wavelength holes having a period, by selectively removing the metal layer by using the photosensitive pattern as a mask; forming, on the metal layer including the transmissive pattern, an insulating layer formed of the same material as the dielectric material; forming a thin film transistor on an inner surface of the first substrate; and bonding the first and second substrates to each other, wherein the second substrate has no color filter and black matrix formed thereon.
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13. A method for fabricating a liquid crystal display (LCD) device, the method comprising:
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providing a first substrate and a second substrate; forming a thin film transistor on the first substrate; forming a metallic film formed of a conductive material on the second substrate; forming, on the metallic film, a dielectric layer formed of a dielectric material having a refractive index equal to or similar to that of the second substrate; forming a predetermined photosensitive pattern on the second substrate having the dielectric layer formed thereon; forming, below the predetermined photosensitive pattern, a dielectric pattern formed of the dielectric material, by selectively removing the dielectric layer by using the photosensitive pattern as a mask; forming, in a metal layer formed of the metallic film, a transmissive pattern consisting of a plurality of sub-wavelength holes having a period, by selectively removing the metal layer by using the photosensitive pattern as a mask; forming, on the metal layer including the transmissive pattern, an insulating layer formed of the same material as the dielectric material; and bonding the first and second substrates to each other.
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Specification