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SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM STORING PROGRAM FOR EXECUTING SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

  • US 20110155181A1
  • Filed: 12/21/2010
  • Published: 06/30/2011
  • Est. Priority Date: 12/25/2009
  • Status: Active Grant
First Claim
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1. A substrate processing method, comprising:

  • a rinse solution supply process for supplying a rinse solution onto a substrate on which a resist pattern is formed; and

    a rinse solution removing process for removing the rinse solution from the substrate in an atmosphere including vapor of a first processing solution that hydrophobicizes the resist pattern.

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