ELECTROMECHANICAL DISPLAY DEVICES AND METHODS OF FABRICATING THE SAME
First Claim
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1. An electromechanical device, comprising:
- a conductive optical absorber formed over a substrate and patterned to form strip electrodes, wherein the optical absorber serves as the primary conductor in said strip electrodes within optically active areas of the electromechanical device;
at least one support structure formed over the optical absorber; and
a conductive deformable layer formed over the at least one support structure and spaced apart from the conductive optical absorber, wherein the deformable layer is electrostatically deflectable towards the optical absorber within said optically active areas of the electromechanical device.
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Abstract
MEMS devices include materials which are used in LCD or OLED fabrication to facilitate fabrication on the same manufacturing systems. Where possible, the same or similar materials are used for multiple layers in the MEMS device, and use of transparent conductors for partially transparent electrodes can be avoided to minimize the number of materials needed and minimize fabrication costs. Certain layers comprise alloys selected to achieve desired properties. Intermediate treatment of deposited layers during the manufacturing process can be used to provide layers having desired properties.
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Citations
24 Claims
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1. An electromechanical device, comprising:
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a conductive optical absorber formed over a substrate and patterned to form strip electrodes, wherein the optical absorber serves as the primary conductor in said strip electrodes within optically active areas of the electromechanical device; at least one support structure formed over the optical absorber; and a conductive deformable layer formed over the at least one support structure and spaced apart from the conductive optical absorber, wherein the deformable layer is electrostatically deflectable towards the optical absorber within said optically active areas of the electromechanical device. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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2. The electromechanical device of claim 2, wherein the optical absorber has a thickness of about 70-75 angstroms.
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16. A method of fabricating an electromechanical device, comprising:
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forming a conductive optical absorber over a substrate; patterning the conductive optical absorber to form strip electrodes, wherein the optical absorber functions as the primary conductor in said strip electrodes in optically active regions of the electromechanical device; forming a sacrificial layer over the optical absorber; forming at least one support structure over the optical absorber; forming a conductive deformable layer over the sacrificial layer and the at least one support structure; and performing a release etch to remove the sacrificial layer, forming a cavity between the deformable layer and the optical absorber. - View Dependent Claims (17, 18, 19, 20, 21)
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22. An electromechanical device, comprising:
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means for absorbing at least a portion of incident light, wherein the absorbing means serves as the primary conductor in said strip electrodes within optically active areas of the electromechanical device; at least one support structure formed over the optical absorber; and conductive deformable layer formed over the at least one support structure and spaced apart from the absorbing means, wherein the deformable layer is electrostatically deflectable towards the absorbing means within said optically active areas of the electromechanical device. - View Dependent Claims (23, 24)
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Specification