MICROELECTROMECHANICAL SYSTEM SUBSTRATE AND DISPLAY APPARATUS HAVING THE SAME

• US 20110157676A1
• Filed: 08/17/2010
• Published: 06/30/2011
• Est. Priority Date: 12/30/2009
• Status: Active Grant

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: CHO, Hyun Min, YOON, Seon-Tae, CHO, Donchan, PARK, Jae Byung, KIM, Yu-Kwan
• Granted Patent: US 8,896,902 B2
• Time in Patent Office: Days
• US Class Current: 359/290
• CPC Class Codes: G02B 26/0841 the reflecting element being moved or deformed by electrostatic means

Abstract

A microelectromechanical system substrate includes a first substrate and an optical gate that is disposed on the first substrate and configured to move to at least two different positions. The optical gate comprises a color filter and a light absorbing section. A display apparatus includes a first substrate; a second substrate that faces the first substrate; an optical gate disposed on the first substrate, configured to move to at least two different positions, and comprising a color filter and a light absorbing section; and a light shielding layer that contacts the second substrate.

Claims

1. A microelectromechanical system substrate, comprising:

a first substrate; and

an optical gate disposed on the first substrate and configured to move to at least two different positions,

wherein the optical gate comprises a color filter and a light absorbing section.

2. The microelectromechanical system substrate of claim 1, further comprising:

a thin film transistor disposed on the first substrate;

a first beam electrically connected to the thin film transistor and disposed on the first substrate; and

a second beam connected to the optical gate and facing the first beam,

wherein the second beam moves the optical gate in response to a voltage difference between the first beam and the second beam.

3. The microelectromechanical system substrate of claim 2, further comprising:

a light shielding layer facing the optical gate and comprising at least one opening corresponding to the color filter.

4. The microelectromechanical system substrate of claim 3, wherein the light absorbing section is arranged below the color filter.

5. The microelectromechanical system substrate of claim 4, wherein the light absorbing section comprises an organic layer or an opaque electrode.

6. The microelectromechanical system substrate of claim 4, wherein the optical gate is interposed between the first substrate and the light shielding layer.

7. The microelectromechanical system substrate of claim 6, wherein the at least one opening overlaps with the color filter at a first position and overlaps with the light absorbing section at a second position that is different from the first position.

8. The microelectromechanical system substrate of claim 7, wherein at least a portion of the color filter overlaps with the at least one opening when a voltage is applied to the first beam, and the light absorbing section overlaps with the at least one opening when the voltage is not applied to the first beam.

9. The microelectromechanical system substrate of claim 7, wherein the color filter overlaps with the at least one opening when a voltage is not applied to the first beam.

10. The microelectromechanical system substrate of claim 4, wherein the optical gate further comprises an optical gate substrate disposed below the light absorbing section.

11. The microelectromechanical system substrate of claim 10, wherein the light absorbing section comprises an organic layer or an opaque electrode.

12. The microelectromechanical system substrate of claim 10, wherein the optical gate further comprises a reflective section disposed between the light absorbing section and the color filter.

13. The microelectromechanical system substrate of claim 12, wherein the light absorbing section comprises an organic layer or an opaque electrode.

14. The microelectromechanical system substrate of claim 13, wherein the at least one opening overlaps with the color filter at a first position and overlaps with the light absorbing section at a second position that is different from the first position.

15. The microelectromechanical system substrate of claim 14, wherein at least a portion of the color filter overlaps with the at least one opening when a voltage is applied to the first beam, and the light absorbing section overlaps with the at least one opening when the voltage is not applied to the first beam.

16. The microelectromechanical system substrate of claim 14, wherein the color filter overlaps with the at least one opening when a voltage is not applied to the first beam.

17. The microelectromechanical system substrate of claim 4, wherein the light absorbing section comprises:

a plurality of second openings; and

a reflective section,

wherein at least a portion of the reflective section is disposed in the second openings.

18. The microelectromechanical system substrate of claim 17, wherein the light absorbing section further comprises an organic layer or an opaque electrode.

19. The microelectromechanical system substrate of claim 18, wherein the optical gate further comprises an optical gate substrate disposed below the light absorbing section.

20. The microelectromechanical system substrate of claim 19, wherein the at least one opening overlaps with the color filter at a first position and overlaps with the light absorbing section at a second position that is different from the first position.

21. The microelectromechanical system substrate of claim 20, wherein at least a portion of the color filter overlaps with the at least one opening when a voltage is applied to the first beam, and the light absorbing section overlaps with the at least one opening when the voltage is not applied to the first beam.

22. The microelectromechanical system substrate of claim 20, wherein the color filter overlaps with the at least one opening when a voltage is not applied to the first beam.

23. The microelectromechanical system substrate of claim 3, wherein the light absorbing section comprises a plurality of second openings, and at least a portion of the color filter is disposed in the second openings.

24. The microelectromechanical system substrate of claim 23, wherein the optical gate further comprises an optical gate substrate disposed below the light absorbing section and the color filter.

25. The microelectromechanical system substrate of claim 24, wherein the optical gate substrate comprises an electrode material to reflect light.

26. The microelectromechanical system substrate of claim 25, wherein the light absorbing section comprises an organic layer or an opaque electrode.

27. The microelectromechanical system substrate of claim 26, wherein the at least one opening overlaps with the color filter at a first position and overlaps with the light absorbing section at a second position that is different from the first position.

28. The microelectromechanical system substrate of claim 27, wherein at least a portion of the color filter overlaps with the at least one opening when a voltage is applied to the first beam, and the light absorbing section overlaps with the at least one opening when the voltage is not applied to the first beam.

29. The microelectromechanical system substrate of claim 27, wherein the color filter overlaps with the at least one opening when a voltage is not applied to the first beam.

30. A display apparatus, comprising:

a first substrate;

a second substrate facing the first substrate;

an optical gate disposed on the first substrate, configured to move to at least two different positions, and comprising a color filter and a light absorbing section; and

a light shielding layer contacting the second substrate.

31. The display apparatus of claim 30, further comprising:

a thin film transistor disposed on the first substrate;

a first beam electrically connected to the thin film transistor and disposed on the first substrate; and

a second beam connected to the optical gate and facing the first beam,

wherein the second beam moves the optical gate in response to a voltage difference between the first beam and the second beam.

32. The display apparatus of claim 31, further comprising a support electrically connected to the thin film transistor and contacting the first beam.

33. The display apparatus of claim 32, further comprising a spacer contacting the support and the light shielding layer to maintain a distance between the first substrate and the second substrate.

34. The display apparatus of claim 31, wherein the light shielding layer comprises at least one opening corresponding to the color filter.