FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-READABLE STORAGE MEDIUM
First Claim
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1. A film deposition apparatus comprising;
- a table, provided inside a vacuum chamber, and having a substrate placing region on which a substrate is placed;
a first reaction gas supply unit and a second reaction gas supply unit provided at separate locations along a circumferential direction of the vacuum chamber, and configured to supply a first reaction gas including titanium (Ti) and a second reaction gas including nitrogen (N) to the substrate on the table, respectively;
a separation region provided between a first process region supplied with the first reaction gas and a second process region supplied with the second reaction gas, and configured to separate the first and second reaction gases;
a rotating mechanism configured to rotate one of the table and the first and second reaction gas supply units relative to each other along the circumferential direction of the vacuum chamber so that the substrate passes the first process region and the second process region in this order;
a vacuum exhaust unit configured to exhaust the inside of the vacuum chamber to vacuum; and
a control unit configured to rotate one of the table and the first and second reaction gas supply units relative to each other via the rotating mechanism at a rotational speed of 100 rpm or higher when depositing a film on the substrate,wherein a titanium nitride film is formed on the substrate by sequentially supplying the first reaction gas and the second reaction gas to a surface of the substrate inside the vacuum chamber.
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Abstract
A film deposition apparatus rotates a turntable and each gas nozzle relatively to each other at a rotational speed of 100 rpm or higher when depositing a titanium nitride film, to speed up a reaction gas supply cycle or a film deposition cycle of a reaction product. A next film of the reaction product is deposited before the grain size of the reaction product already generated on a substrate surface begins to grow due to crystallization of the already generated reaction product.
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Citations
15 Claims
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1. A film deposition apparatus comprising;
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a table, provided inside a vacuum chamber, and having a substrate placing region on which a substrate is placed; a first reaction gas supply unit and a second reaction gas supply unit provided at separate locations along a circumferential direction of the vacuum chamber, and configured to supply a first reaction gas including titanium (Ti) and a second reaction gas including nitrogen (N) to the substrate on the table, respectively; a separation region provided between a first process region supplied with the first reaction gas and a second process region supplied with the second reaction gas, and configured to separate the first and second reaction gases; a rotating mechanism configured to rotate one of the table and the first and second reaction gas supply units relative to each other along the circumferential direction of the vacuum chamber so that the substrate passes the first process region and the second process region in this order; a vacuum exhaust unit configured to exhaust the inside of the vacuum chamber to vacuum; and a control unit configured to rotate one of the table and the first and second reaction gas supply units relative to each other via the rotating mechanism at a rotational speed of 100 rpm or higher when depositing a film on the substrate, wherein a titanium nitride film is formed on the substrate by sequentially supplying the first reaction gas and the second reaction gas to a surface of the substrate inside the vacuum chamber. - View Dependent Claims (2, 3, 4, 5)
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6. A film deposition method for sequentially supplying a first reaction gas including titanium (Ti) and a second reaction gas including nitrogen (N) to a surface of a substrate inside a vacuum chamber in order to form a titanium nitride film, comprising:
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supplying the first reaction gas and the second reaction gas from a first reaction gas supply unit and a second reaction gas supply unit that are provided at separate locations along a circumferential direction of the vacuum chamber, with respect to a surface of a table that includes a substrate placing region in which the substrate is placed; separating the first and second reaction gases in a separation region provided between a first process region supplied with the first reaction gas and a second process region supplied with the second reaction gas; rotating one of the table and the first and second reaction gas supply units relative to each other along the circumferential direction of the vacuum chamber at a rotational speed of 100 rpm or higher so that the substrate passes the first process region and the second process region in this order; and exhausting the inside of the vacuum chamber to vacuum. - View Dependent Claims (7, 8, 9, 10)
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11. A tangible computer-readable storage medium which stores a program which, when executed by a computer, causes the computer to perform a process of a film deposition apparatus that sequentially supplies a first reaction gas including titanium (Ti) and a second reaction gas including nitrogen (N) to a surface of a substrate inside a vacuum chamber in order to form a titanium nitride film, said process comprising:
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a supplying procedure causing the computer to supply the first reaction gas and the second reaction gas from a first reaction gas supply unit and a second reaction gas supply unit that are provided at separate locations along a circumferential direction of the vacuum chamber, with respect to a surface of a table that includes a substrate placing region in which the substrate is placed; a separating procedure causing the computer to separate the first and second reaction gases in a separation region provided between a first process region supplied with the first reaction gas and a second process region supplied with the second reaction gas; a rotating procedure causing the computer to rotate one of the table and the first and second reaction gas supply units relative to each other along the circumferential direction of the vacuum chamber at a rotational speed of 100 rpm or higher so that the substrate passes the first process region and the second process region in this order; and an exhausting procedure causing the computer to exhaust the inside of the vacuum chamber to vacuum. - View Dependent Claims (12, 13, 14, 15)
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Specification