GOLD-COATED POLYSILICON REACTOR SYSTEM AND METHOD
First Claim
Patent Images
1. A reactor system, comprising:
- a reaction chamber including at least a base plate fixed within the reaction chamber and an enclosure operably connected to the base plate, at least a portion of the reaction chamber being coated with a layer of gold having a thickness of at least about 0.1 microns;
at least one filament attached to the base plate;
an electrical current source for supplying a current to the filament; and
a gas source operably connected to the reaction chamber to allow gas flow through the reaction chamber.
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Abstract
A reaction chamber system, and related devices and methods for use in the system, are provided in which reduced power consumption can be achieved by providing a thin layer of gold on one or more components inside a reaction chamber. The reaction chamber system can be used for chemical vapor deposition. The gold coating should be maintained to a thickness of at least about 0.1 microns, and more preferably about 0.5 to 3.0 microns, to provide a suitable emissivity inside the reaction chamber, and thus reduce heat losses.
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Citations
23 Claims
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1. A reactor system, comprising:
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a reaction chamber including at least a base plate fixed within the reaction chamber and an enclosure operably connected to the base plate, at least a portion of the reaction chamber being coated with a layer of gold having a thickness of at least about 0.1 microns; at least one filament attached to the base plate; an electrical current source for supplying a current to the filament; and a gas source operably connected to the reaction chamber to allow gas flow through the reaction chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A reaction chamber for use in a chemical vapor deposition reactor, comprising:
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at least a base plate fixed within the reaction chamber; at least one filament attached to the base plate, the reaction chamber being operably connected to an electrical current source and a gas source to allow deposition of a material on the filament; and at least a portion of the reaction chamber being coated with a layer of gold having a thickness of at least about 0.1 microns. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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16. A method for depositing a material in a reactor, comprising the steps of:
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providing a reaction chamber including at least a base plate fixed within the reaction chamber and an enclosure operably connected to the base plate, at least a portion of the reaction chamber being coated with a layer of gold having a thickness of at least about 0.1 microns; attaching at least one filament to the base plate; connecting an electrical current source to the reaction chamber for supplying a current to the filament; connecting a gas source to the reaction chamber to allow gas flow through the reaction chamber; and operating the reactor to deposit the material on the filament in the reaction chamber. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23)
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Specification