METHOD FOR MANUFACTURING DISPLAY DEVICE
First Claim
1. A method for manufacturing a display device, comprising the steps of:
- forming a pixel portion comprising a thin film transistor comprising an oxide semiconductor layer over a first substrate;
forming a sealant comprising an ultraviolet curable resin over the first substrate to surround at least the pixel portion;
forming a liquid crystal layer to overlap the pixel portion by dropping a liquid crystal in a region surrounded by the sealant over the first substrate;
attaching a second substrate to the first substrate with the sealant between the second substrate and the first substrate;
curing the sealant with ultraviolet light irradiation; and
performing heat treatment for repairing a damage to the oxide semiconductor layer caused by the ultraviolet light irradiation.
1 Assignment
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Accused Products
Abstract
One object is to provide a method for manufacturing a display device in which shift of the threshold voltage of a thin film transistor including an oxide semiconductor layer can be suppressed even when ultraviolet light irradiation is performed in the process for manufacturing the display device. In the method for manufacturing a display device, ultraviolet light irradiation is performed at least once, a thin film transistor including an oxide semiconductor layer is used for a switching element, and heat treatment for repairing damage to the oxide semiconductor layer caused by the ultraviolet light irradiation is performed after all the steps of ultraviolet light irradiation are completed.
33 Citations
36 Claims
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1. A method for manufacturing a display device, comprising the steps of:
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forming a pixel portion comprising a thin film transistor comprising an oxide semiconductor layer over a first substrate; forming a sealant comprising an ultraviolet curable resin over the first substrate to surround at least the pixel portion; forming a liquid crystal layer to overlap the pixel portion by dropping a liquid crystal in a region surrounded by the sealant over the first substrate; attaching a second substrate to the first substrate with the sealant between the second substrate and the first substrate; curing the sealant with ultraviolet light irradiation; and performing heat treatment for repairing a damage to the oxide semiconductor layer caused by the ultraviolet light irradiation. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for manufacturing a display device, comprising the steps of:
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forming a pixel portion comprising a thin film transistor comprising an oxide semiconductor layer over a first substrate; forming a sealant comprising an ultraviolet curable resin over a second substrate to surround at least the pixel portion; forming a liquid crystal layer by dropping a liquid crystal in a region surrounded by the sealant over the second substrate; attaching the first substrate to the second substrate with the sealant between the first substrate and the second substrate so that the pixel portion overlaps with the liquid crystal layer; curing the sealant with ultraviolet light irradiation; and performing heat treatment for repairing a damage to the oxide semiconductor layer caused by the ultraviolet light irradiation. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18)
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19. A method for manufacturing a display device, comprising the steps of:
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forming a pixel portion comprising a thin film transistor comprising an oxide semiconductor layer over a first substrate; forming a sealant comprising an ultraviolet curable resin over the first substrate to surround at least the pixel portion; attaching a second substrate to the first substrate with the sealant between the second substrate and the first substrate; curing the sealant with ultraviolet light irradiation; injecting a liquid crystal into a space enclosed by the first substrate, the second substrate, and the sealant through an opening of the sealant so that a liquid crystal layer is formed to overlap with the pixel portion; and performing heat treatment for repairing a damage to the oxide semiconductor layer caused by the ultraviolet light irradiation. - View Dependent Claims (20, 21, 22, 23, 24, 25)
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26. A method for manufacturing a display device, comprising the steps of:
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forming a pixel portion comprising a thin film transistor comprising an oxide semiconductor layer over a first substrate; forming a sealant comprising an ultraviolet curable resin over a second substrate; attaching the first substrate to the second substrate with the sealant between the first substrate and the second substrate so that the pixel portion is enclosed by the first substrate, the second substrate and the sealant; curing the sealant with ultraviolet light irradiation; injecting a liquid crystal into a space enclosed by the first substrate, the second substrate, and the sealant through an opening of the sealant so that a liquid crystal layer is formed to overlap with the pixel portion; and performing heat treatment for repairing a damage to the oxide semiconductor layer caused by the ultraviolet light irradiation. - View Dependent Claims (27, 28, 29, 30, 31, 32)
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33. A method for manufacturing a display device, comprising the steps of:
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forming a pixel portion comprising a thin film transistor comprising an oxide semiconductor layer over a first substrate; forming a light-emitting element electrically connected to the thin film transistor over the thin film transistor; forming a sealant comprising an ultraviolet curable resin over any one of the first substrate and a second substrate; attaching the first substrate to the second substrate with the sealant between the first substrate and the second substrate so that the pixel portion is enclosed by the first substrate, the second substrate and the sealant; curing the sealant with ultraviolet light irradiation; and performing heat treatment for repairing a damage to the oxide semiconductor layer caused by the ultraviolet light irradiation. - View Dependent Claims (34, 35, 36)
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Specification