CHAMBER WITH UNIFORM FLOW AND PLASMA DISTRIBUTION
First Claim
1. A recursive liner system, comprising:
- an outer liner having an outer portion configured to line the walls of a process chamber, a bottom portion extending inward from the outer portion, and a lip extending up from the bottom portion to define a well; and
an inner liner having a lower portion configured to be at least partially disposed in the well to define, together with the outer liner, a recursive flow path therebetween.
1 Assignment
0 Petitions
Accused Products
Abstract
Embodiments of the present invention provide a recursive liner system that facilitates providing more uniform flow of gases proximate the surface of a substrate disposed within an apparatus for processing a substrate (e.g., a process chamber). In some embodiments, a recursive liner system may include an outer liner having an outer portion configured to line the walls of a process chamber, a bottom portion extending inward from the outer portion, and a lip extending up from the bottom portion to define a well; and an inner liner having a lower portion configured to be at least partially disposed in the well to define, together with the outer liner, a recursive flow path therebetween.
-
Citations
19 Claims
-
1. A recursive liner system, comprising:
-
an outer liner having an outer portion configured to line the walls of a process chamber, a bottom portion extending inward from the outer portion, and a lip extending up from the bottom portion to define a well; and an inner liner having a lower portion configured to be at least partially disposed in the well to define, together with the outer liner, a recursive flow path therebetween. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
-
9. An apparatus for processing substrates, comprising:
-
a process chamber having a processing volume and an exhaust volume; a substrate support disposed in the process chamber and configured to support a substrate in a lower portion of the processing volume; and a recursive liner system disposed in the process chamber, the recursive liner system, comprising; an outer liner having an outer portion configured to line outer walls of the process chamber, a bottom portion extending inward from the outer portion, and a lip extending up from the bottom portion to define a well; and an inner liner coupled to the substrate support and having a lower portion configured to be at least partially disposed in the well to define, together with the outer liner, a recursive flow path therebetween. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17)
-
-
18. An apparatus for processing substrates, comprising:
-
a process chamber having a processing volume and an exhaust volume; a substrate support disposed in the process chamber to support a substrate in a lower portion of the processing volume; and a recursive liner system disposed in the process chamber, the recursive liner system, comprising; an outer liner that provides provide a uniform RF ground path, the outer liner having an outer portion to line outer walls of the process chamber, a bottom portion extending inward from the outer portion, and a lip extending up from the bottom portion to define a well; an inner liner coupled to the substrate support and having a lower portion at least partially disposed in the well and spaced apart from surfaces of the outer liner; and a recursive flow path disposed within the well between the outer liner and the inner liner. - View Dependent Claims (19)
-
Specification