HYDROPHILIC COATINGS, METHODS FOR DEPOSITING HYDROPHILIC COATINGS AND IMPROVED DEPOSITION TECHNOLOGY FOR THIN FILMS

• US 20110165413A1
• Filed: 02/28/2011
• Published: 07/07/2011
• Est. Priority Date: 12/03/2004
• Status: Abandoned Application

• Current Assignee: Cardinal CG Company (Cardinal Glass Industries Incorporated)
• Original Assignee: Cardinal CG Company (Cardinal Glass Industries Incorporated)
• Inventors: Hartig, Klaus
• Application Number:
  US13/036,155
• Publication Number:
  US 20110165413A1
• Time in Patent Office: Days
• US Class Current: 428/337
• CPC Class Codes: C03C 17/36 at least one coating being a metal
• CPC Class Codes: C03C 17/366 Low-emissivity or solar control coatings
• CPC Class Codes: C03C 2217/71 Photocatalytic coatings
• CPC Class Codes: C03C 2217/75 Hydrophilic and oleophilic coatings
• CPC Class Codes: C03C 2217/78 Coatings specially designed to be durable, e.g. scratch-resistant
• CPC Class Codes: C03C 2218/154 by sputtering
• CPC Class Codes: C03C 2218/365 Coating different sides of a glass substrate
• CPC Class Codes: C23C 14/08 Oxides C23C14/10 takes precedence
• CPC Class Codes: C23C 14/3464 using more than one target C23C14/56 takes precedence
• CPC Class Codes: Y10T 428/252 Glass or ceramic [i.e., fired or glazed clay, cement, etc.] [porcelain, quartz, etc.]
• CPC Class Codes: Y10T 428/266 of base or substrate

Abstract

The invention provides certain embodiments that involve sputtering techniques for applying a mixed oxide film comprising silica and titania. In these embodiments, the techniques involve sputtering at least two targets in a common chamber (e.g., in a shared gaseous atmosphere). A first of these targets includes silicon, while a second of the targets includes titanium. Further, the invention provides embodiments involving a substrate bearing a hydrophilic coating, which can be deposited by sputtering or any other suitable thin film deposition technique. The invention also provides techniques and apparatuses useful for depositing a wide variety of coating types. For example, the invention provides thin film deposition technologies in which sputtering apparatuses or other thin film deposition apparatuses are employed.

Claims

1. A substrate having a coating, the substrate being an engineered glass sheet, the glass sheet having a desired outer thickness defining a major surface of the glass sheet, the desired outer thickness providing a foundation for a hydrophilic coating, said desired outer thickness having a different composition than glass forming a core of the glass sheet.

2. The substrate of claim 1, wherein said desired outer thickness is between about 40 angstroms and about 1 micron thick.

3. The substrate of claim 2, wherein said desired outer thickness is between about 40 angstroms and about 1000 angstroms thick.

4. The substrate of claim 1, wherein said desired outer thickness provides a sodium ion diffusion barrier.

5. The substrate of claim 1, wherein a desired film is provided between the hydrophilic coating and said desired outer thickness of the glass sheet.

6. The substrate of claim 5, wherein said desired film comprises SiO₂.