LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

• US 20110170077A1
• Filed: 08/04/2010
• Published: 07/14/2011
• Est. Priority Date: 11/12/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Sengers, Timotheus Franciscus, Donders, Sjoerd Nicolaas Lambertus, Bijlaart, Erik Theodorus Maria, Meijer, Hendricus Johannes Maria, Mulkens, Johannes Catharinus Hubertus, Butler, Hans, Streefkerk, Bob, Van Schaik, Frank, De Smit, Joannes Theodoor, Loopstra, Erik Roelof, Straaijer, Alexander, Mertens, Jeroen Johannes Sophia Maria, Ritsema, Roelof Aeilko Siebrand, Van Santen, Helmar, Simon, Klaus, Hoogendam, Christiaan Alexander, Kolesnychenko, Aleksey, LOF, Joeri
• Granted Patent: US 8,558,989 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Claims

1-51. -51. (canceled)

52. A lithographic projection apparatus comprising:

a projection system configured to project a beam onto a target portion of a substrate, a space between the projection system and the substrate being filled with a liquid; and

a liquid confinement structure, the liquid confinement structure and the projection system being configured to form a capillary passage therebetween.

57. The apparatus according to claim 52, wherein the liquid confinement structure has an opposite portion which faces the substrate during the projection of the beam.

58. The apparatus according to claim 52, wherein the capillary passage is formed between a side surface of the optical member and the liquid confinement structure.

59. The apparatus according to claim 52, wherein the capillary passage includes a slope portion.

53. A lithographic projection apparatus comprising:

an optical member through which an exposure beam is directed onto a substrate, a space between the optical member and the substrate being filled with a liquid during the exposure; and

a liquid immerged member which makes contact with the liquid, the liquid immerged member and the optical member forming a capillary passage therebetween.

54. The apparatus according to claim 53, wherein the liquid immerged member has an opposite portion which faces the substrate during the exposure.

55. The apparatus according to claim 53, wherein the capillary passage is formed between a side surface of the optical member and the liquid immerged member.

56. The apparatus according to claim 53, wherein the capillary passage includes a slope portion.

60. An exposure method, comprising:

projecting an exposure beam of radiation through an optical member onto a target portion of a substrate, a space between the optical member and the substrate being filled with a liquid during the projection; and

drawing liquid into a capillary passage between the optical member and a liquid immerged member which makes contact with the liquid.

61. The method according to claim 60, wherein the liquid immerged member has an opposite portion which faces the substrate during the projection.

62. The method according to claim 60, wherein the capillary passage is formed between a side surface of the optical member and the liquid immerged member.

63. The method according to claim 60, wherein the capillary passage includes a slope portion.

64. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam onto a target portion of a substrate; and

a substrate table configured to hold the substrate, the substrate table comprising;

an edge seal member configured to at least partly surround an edge of the substrate, an object positioned on the substrate table, or both, and

a vacuum port, a liquid supply port, or both, positioned to provide respectively vacuum or liquid to the gap between the edge seal member and the substrate, the object, or both, on a side opposite the projection system; and

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate, the object, or both.

65. The apparatus according to claim 64, wherein the substrate table further comprises a channel positioned radially inwardly of the vacuum port, the channel being connected to a gas source such that on actuation of the vacuum a flow of gas radially outwardly from the channel towards the vacuum can be established.

66. The apparatus according to claim 65, wherein one or more burls configured to be in contact with the substrate, the object, or both, are present radially outwardly of the channel and inwardly of the vacuum port.

67. The apparatus according to claim 64, wherein the substrate table comprises a portion which extends below the substrate, the object, or both, and is radially outwardly of the vacuum port.

68. The apparatus according to claim 67, wherein the portion has one or more parts which extend up to the substrate, the object, or both, to at least partly support the substrate, the object, or both.

69. The apparatus according to claim 67, wherein the portion is part of a pimple table which supports the substrate.

70. The apparatus according to claim 64, further comprising a compartment in the substrate table in fluid connection with the gap via the vacuum port and with the vacuum.

71. The apparatus according to claim 64, wherein the vacuum port is annular.

72. The apparatus according to claim 64, wherein the vacuum port is discontinuous.

73. The apparatus according to claim 64, wherein the vacuum port is continuous.

74. The apparatus according to claim 64, wherein the vacuum port is positioned adjacent an edge portion of the edge seal member.

75. The apparatus according to claim 64, wherein the object comprises a sensor.

76. The apparatus according to claim 64, wherein the edge seal member is glued to the substrate, the object, or both, around a periphery of the substrate, the object, or both.

77. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam onto a target portion of a substrate;

a substrate table configured to hold the substrate, the substrate table comprising an edge seal member configured to at least partly surround an edge of a substrate, an object, or both, positioned on the substrate table and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the substrate, the object, or both; and

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate, the object, or both, and to a localized area of (i) the object, (ii) the edge seal member, (iii) the substrate, or (iv) any combination of (i)-(iii).

78. The apparatus according to claim 77, wherein the edge seal member and the substrate, the object, or both, are moveably mounted relative to one another.

79. The apparatus according to claim 77, wherein the edge seal member is moveable in a plane substantially parallel to the primary surface of the edge seal member to vary the distance between the edge seal member and the substrate, the object, or both.

80. The apparatus according to claim 77, wherein the substrate table comprises an actuator configured to move the edge seal member relative to a remainder of the substrate table in a direction substantially parallel to the optical axis of the apparatus.

81. The apparatus according to claim 80, wherein the actuator comprises a wedge member which, on movement in a direction substantially parallel to the primary surface of the edge seal member, is effective to move the edge seal member relative to a remainder of the substrate table in the direction substantially parallel to the optical axis of the apparatus.

82. The apparatus according to claim 81, wherein the wedge is configured to lock in place on removal of an actuation force by virtue of the coefficient of friction of the wedge.

83. The apparatus according to claim 77, wherein the substrate table comprises a hydrophobic layer adjacent an edge portion of the edge seal member and the substrate, the object, or both, on an opposite side of the edge seal member and the substrate, the object, or both, to the projection system.

84. The apparatus according to claim 83, wherein the liquid has a contact angle of greater than 90°

with the hydrophobic layer.

85. The apparatus according to claim 77, wherein the edge seal member has a projection with a top surface co-planar with the primary surface of the edge seal member and extending towards the optical axis of the apparatus.

86. The apparatus according to claim 77, wherein the substrate table comprises a gap seal member configured to abut or at least partly overlap, in the direction of the optical axis, both the edge seal member and the substrate, the object, or both.

87. The apparatus according to claim 86, wherein the gap seal member is configured to be in contact with the primary surfaces thereby spanning a gap between the edge seal member and the substrate, the object, or both.

88. The apparatus according to claim 86, wherein the gap seal member has inner and outer edges at least one of which edges is tapered such that the distance of the surface of the gap seal member facing away from the primary surface of the edge seal member or the substrate, the object, or both, decreases towards the edge of the gap seal member.

89. The apparatus according to claim 86, wherein the substrate table comprises a vacuum port in the primary surface of the edge seal member configured to hold the gap seal member in place.

90. The apparatus according to claim 77, wherein the substrate table comprises an actuator configured to vary the distance of the primary surface of the substrate, the object, or both, relative to the remainder of the substrate table.

91. The apparatus according to claim 77, wherein the object comprises a sensor.

92. The apparatus according to claim 77, wherein the edge seal member is glued to the substrate, the object, or both, around a periphery of the substrate, the object, or both.

93. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam onto a target portion of a substrate;

a substrate table configured to hold the substrate, the substrate table comprising;

an edge seal member configured to at least partly surround an edge of a substrate, an object, or both, positioned on the substrate table, and

a further edge seal member configured to extend across the gap between the edge seal member and the substrate, the object, or both, and to be in contact with the substrate, the object, or both; and

a liquid supply system configured provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate, the object, or both.

94. The apparatus according to claim 93, wherein the further edge seal member is flexible.

95. The apparatus according to claim 94, wherein the flexible further edge seal member is attached to the edge seal member.

96. The apparatus according to claim 94, wherein the flexible further edge seal member has a port, connected to a vacuum source, adjacent its end distal from the edge seal member, such that on actuation of the vacuum source, the flexible further edge seal member is deflectable upwards to contact against the substrate, the object, or both, to form a seal between the flexible further edge seal member and the substrate, the object, or both, due to the force generated by the vacuum source acting on the substrate, the object, or both.

97. The apparatus according to claim 94, further comprising a second flexible further edge seal member attached under the substrate, the object, or both, to the substrate table and with a free end radially outwardly from the attachment point.

98. The apparatus according to claim 94, wherein the flexible further edge seal member is disposed between the edge seal member and the substrate, the object, or both, and with a surface substantially co-planar with the primary surfaces of the edge seal member and the substrate, the object, or both.

99. The apparatus according to claim 98, wherein the flexible further edge seal member is shaped to contact the substrate, the object, or both, on a surface opposite its primary surface.

100. The apparatus according to claim 98, wherein the flexible further edge seal member is effective to apply a force to the substrate, the object, or both, away from the substrate table when the substrate, the object, or both, is held on the substrate table.

101. The apparatus according to claim 93, wherein the object comprises a sensor.

102. The apparatus according to claim 93, wherein the edge seal member, the further edge seal member, or both, is glued to the substrate, the object, or both, around a periphery of the substrate, the object, or both.

103. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam onto a target portion of a substrate;

a substrate table configured to hold the substrate, the substrate table comprising a support surface configured to support an intermediary plate between the projection system and a substrate and an object positioned on the substrate table and not in contact with the substrate and the object; and

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate, the object, or both.

104. The apparatus according to claim 103, wherein the liquid supply system includes a liquid supply port configured to provide a liquid to a space between the intermediary plate and the substrate, the object, or both.

105. The apparatus according to claim 103, wherein the substrate table comprises a transmission image sensor configured to sense a beam and wherein the intermediary plate is positionable between the sensor and the projection system.

106. The apparatus according to claim 103, wherein the liquid supply system comprises a projection system liquid supply system configured to provide a liquid in a space between the projection system and the intermediary plate.

107. The apparatus according to claim 103, wherein the intermediary plate has a cross sectional area in a plane perpendicular to the optical axis of the apparatus greater than that of an object positioned on the substrate table such that all the edges of the substrate, the object, or both, can be covered by the intermediary plate.

108. The apparatus according to claim 103, wherein the object comprises a sensor.

109. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam onto a target portion of a substrate;

a substrate table configured to hold the substrate; and

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and a substrate, an object, or both, positioned on the substrate table, wherein a structure of the liquid supply system extends along at least part of the boundary of the space between the projection system and the substrate table and capillaries extend away from the substrate table and are positioned between the structure and the projection system.

110. The apparatus according to claim 109, wherein the capillaries comprise tubes.

111. The apparatus according to claim 110, wherein the capillaries comprise a porous membrane.

112. The apparatus according to claim 109, wherein the capillaries comprise an inner hydrophobic coating.

113. The apparatus according to claim 109, comprising an electric device configured to apply a potential difference between the liquid in the space and the capillaries.

114. The apparatus according to claim 109, wherein the object comprises a sensor.