Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method
First Claim
1. A liquid immersion type projection exposure apparatus in which a gap between an optical element and an object of exposure is filled with a liquid and the object is exposed, the liquid immersion type projection exposure apparatus comprising:
- a liquid supply system which supplies the liquid to the gap; and
cleaning means for removing adhering substances within a flow path of the liquid, the flow path being separate from the gap and supplying the liquid to the gap.
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Abstract
A projection exposure apparatus that exposes a substrate with a liquid interposed between a surface of the substrate and an optical element on the substrate side of a projection optical system; includes liquid supply and discharge mechanisms, which supply the liquid via a liquid supply tube as they recover the liquid via a liquid recovery tube, and an adhesion preventing mechanism that prevents an adhesion of impurities on member forming a flow path for the liquid.
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Citations
31 Claims
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1. A liquid immersion type projection exposure apparatus in which a gap between an optical element and an object of exposure is filled with a liquid and the object is exposed, the liquid immersion type projection exposure apparatus comprising:
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a liquid supply system which supplies the liquid to the gap; and cleaning means for removing adhering substances within a flow path of the liquid, the flow path being separate from the gap and supplying the liquid to the gap. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 29, 30)
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10. A cleaning method of a liquid immersion type projection exposure apparatus in which a gap between an optical element and an object of exposure is filled with a liquid and the object is exposed, the method comprising:
causing, when supplying the liquid, a liquid supply volume and a liquid recovery flow volume to fluctuate to remove adhering substances in a flow path of the liquid. - View Dependent Claims (11, 27)
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12. A cleaning method of a liquid immersion type projection exposure apparatus in which a gap between an optical element and an object of exposure is filled with a liquid, the method comprising:
mixing, when supplying the liquid, one or more bubbles of a volume of 1 ml or less into the liquid to clean an inside of a flow path of the liquid. - View Dependent Claims (28)
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13. A liquid immersion type projection exposure apparatus that fills a space between a first object and a second object with a liquid and irradiates exposure light onto an object of exposure via the liquid, the liquid immersion type projection exposure apparatus comprising:
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a liquid supply system which supplies the liquid to the space; a liquid recovery system which recovers the liquid from the space; and a cleaning device that cleans a flow path of the liquid, the flow path being separate from the space and discharging the liquid from the space. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 31)
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23. A maintenance method of a liquid immersion type projection exposure apparatus in which a gap between a first object and a second object is filled with a liquid and an object of exposure is exposed, the method comprising:
cleaning a flow path of the liquid, when exposure of the object is not being performed, the flow path being separate from the gap and supplying the liquid to the gap or discharging the liquid from the gap. - View Dependent Claims (24, 25, 26)
Specification