Lithographic Apparatus and Device Manufacturing Method

• US 20110171759A1
• Filed: 03/21/2011
• Published: 07/14/2011
• Est. Priority Date: 05/09/2006
• Status: Abandoned Application

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Auer, Frank, BUTLER, Hans
• Application Number:
  US13/052,190
• Publication Number:
  US 20110171759A1
• Time in Patent Office: Days
• US Class Current: 438/5
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation
• CPC Class Codes: H01L 21/0274 Photolithographic processes

Abstract

Data from the piezo-electric sensors in the mounts for the projection system can be used in the control loops for other parts of the lithographic apparatus, for example the mask table, the substrate table or the air mounts for the frame bearing the projection system. Information from, for example, a geophone, which is used to measure the absolute velocity of the frame bearing the projection system, can be used in the control loop for the piezo-electric actuator in the mount for the projection system.

Claims

1. A lithographic apparatus comprising:

a support constructed to support a patterning device to pattern a radiation beam;

a substrate table constructed to hold a substrate;

a projection system configured to project a patterned beam onto a target portion of said substrate;

a frame constructed to hold said projection system; and

a mount constructed to support said projection system on said frame, said mount comprising a piezo-electric sensor constructed to detect a force applied to said projection system,

wherein a position of said support and/or said substrate table is/are controlled based on said detected force.

2. A lithographic apparatus according to claim 1, wherein said piezo-electric sensor detects the force applied in six directions.

3. A lithographic apparatus according to claim 1, wherein said mount comprises a plurality of piezo-electric sensors.

4. A lithographic apparatus according to claim 1, where said mount further comprises a piezo-electric actuator constructed to apply a force to said projection system.

5. A device manufacturing method comprising:

holding a patterning device that is configured to pattern a radiation beam using a support;

holding a substrate using a substrate table;

projecting a patterned beam of radiation onto a target portion of said substrate using a projection system;

holding said projection system using a frame;

supporting said projection system or said frame using a mount, said mount comprising a piezo-electric sensor to detect the force applied to said projection system; and

controlling a position of said support and/or said substrate table based on said detected force.

6. A lithographic apparatus comprising:

a projection system configured to project a patterned beam onto a target portion of a substrate

a frame constructed to hold said projection system;

a mount constructed to support said projection system on said frame, said mount comprising a piezo-electric sensor constructed to detect the force applied to said projection system; and

a second mount constructed to support said flame and minimize vibration of said frame,

wherein the vibration of said frame is minimized by controlling said second mount based on said detected force.

7. A lithographic apparatus according to claim 6, further comprising a plurality of second mounts, each constructed to support said frame and minimize vibration of said frame, wherein the vibration of said frame is minimized by controlling each second mount based on said detected force.

8. A lithographic apparatus according to claim 6, wherein said second mount is an airmount.

9. A lithographic apparatus according to claim 6, wherein said mount further comprises a piezo-electric actuator constructed to apply a force to said projection system.

10. A device manufacturing method comprising:

projecting a patterned beam of radiation onto a target portion of said substrate using a projection system;

holding said projection system using a frame;

supporting said projection system on said frame using a mount, said mount comprising a piezo-electric sensor to detect the force applied to said projection system;

supporting said frame and minimizing a vibration of said frame using a second mount; and

controlling said second mount to minimize the vibration of said frame based on said detected force.