Three Dimensional Integration and Methods of Through Silicon Via Creation
First Claim
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1. A method comprising:
- patterning a photoresist layer on a structure to define an opening and expose a first planar area on a substrate layer;
etching the exposed planar area to form a cavity having a first depth in the structure;
removing a second portion of the photoresist to expose a second planar area on the substrate layer;
forming a doped portion in the second planar area; and
etching the cavity to expose a first conductor in the structure and the doped portion to expose a second conductor in the structure.
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Abstract
A method includes patterning a photoresist layer on a structure to define an opening and expose a first planar area on a substrate layer, etching the exposed planar area to form a cavity having a first depth in the structure, removing a second portion of the photoresist to expose a second planar area on the substrate layer, forming a doped portion in the second planar area, and etching the cavity to expose a first conductor in the structure and the doped portion to expose a second conductor in the structure.
101 Citations
20 Claims
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1. A method comprising:
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patterning a photoresist layer on a structure to define an opening and expose a first planar area on a substrate layer; etching the exposed planar area to form a cavity having a first depth in the structure; removing a second portion of the photoresist to expose a second planar area on the substrate layer; forming a doped portion in the second planar area; and etching the cavity to expose a first conductor in the structure and the doped portion to expose a second conductor in the structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method comprising:
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patterning a photoresist layer on a structure to define an opening and expose a first planar area on a sacrificial substrate layer; etching to the exposed first planar area to form a cavity having a first depth in the structure; removing a portion of the photoresist to increase the size of the opening to define a second planar area on the sacrificial substrate layer; forming a doped portion in the sacrificial substrate layer; and etching the cavity to increase the depth of the cavity to expose a first conductor in the structure and to increase the planar area and depth of a portion of the cavity to expose a second conductor in the structure. - View Dependent Claims (10, 11, 12, 13, 14, 15, 19, 20)
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16. A method comprising:
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patterning a photoresist layer on a structure to define an opening and expose a first planar area on a substrate layer; forming doped portions of the substrate layer in the first planar area; removing a portion of the photoresist to form a second opening defining a second planar area on the substrate layer; and etching to form a first cavity having a first depth defined by the first opening to expose a first contact in the structure and to form a second cavity defined by the second opening to expose a second contact in the structure. - View Dependent Claims (17, 18)
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Specification