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PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND END POINT DETECTION METHOD

  • US 20110174776A1
  • Filed: 08/26/2008
  • Published: 07/21/2011
  • Est. Priority Date: 08/28/2007
  • Status: Abandoned Application
First Claim
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1. A plasma processing apparatus comprising:

  • a processing chamber for carrying out plasma processing of a processing object;

    a plasma generation means for generating a plasma in the processing chamber;

    a measurement means for measuring an integrated value of the particle number of an active species contained in the plasma and moving toward the processing object; and

    a control means for controlling the operation of the plasma processing apparatus in such a manner as to terminate the plasma processing when the integrated value has reached a set value.

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