MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

• US 20110181852A1
• Filed: 03/21/2011
• Published: 07/28/2011
• Est. Priority Date: 09/30/2008
• Status: Active Grant

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Inventors: Benz, Daniel, Kwan, Yim-Bun Patrick, Waldis, Severin, Bleidistel, Sascha, Bach, Florian, Werber, Armin
• Granted Patent: US 8,767,176 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G02B 17/002 Arrays of reflective systems
• CPC Class Codes: G02B 26/0833 the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD G02B26/0825 takes precedence; micromechanical devices in general B81B
• CPC Class Codes: G02B 7/1827 Motorised alignment
• CPC Class Codes: G03F 7/70116 Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
• CPC Class Codes: G03F 7/702 Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70891 Temperature

Abstract

A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.

Claims

1. A projection exposure apparatus, comprising:

a mirror array, comprising;

a base body; and

a plurality of mirror units, each mirror unit comprising;

a mirror;

a control device configured to modify a position of the mirror relative to the base body; and

thermal conduction elements, the thermal conduction elements being connected to the mirror, the thermal conduction elements not contributing to the bearing of the mirror, and the thermal conduction elements extending in a direction of the base body so that heat can be transferred from the thermal conduction elements to the base body,

wherein the projection exposure apparatus is a microlithographic projection exposure apparatus.

2. The projection exposure apparatus of claim 1, wherein the thermal conduction elements are connected to the base body.

3. The projection exposure apparatus of claim 2, wherein the thermal conduction elements comprise flexible fibres and/or flexible bands.

4. The projection exposure apparatus of claim 2, further comprising rigid counter-elements from extending form the base body, wherein the thermal conduction elements comprise rigid bars, and the rigid counter-elements are separated from the rigid bars only by a gap even when the position of the mirror is modified.

5. The projection exposure apparatus of claim 4, wherein the gap has a width which is less than 1/10 of a maximum dimension of a reflective surface of the mirror.

6. The projection exposure apparatus of claim 4, wherein the rigid bars are arranged on the mirror and the rigid counter-elements are arranged on the base body so that the rigid bars and the counter-elements mutually engage in a comb-like fashion.

7. The projection exposure apparatus of claim 4, wherein the gap is filled with a fluid.

8. The projection exposure apparatus of claim 7, wherein the fluid comprises a liquid.

9. The projection exposure apparatus of claim 8, wherein the rigid bars and the rigid counter-elements are configured in the form of cylinder wall segments and are arranged concentrically.

10. The projection exposure apparatus of claim 4, wherein the rigid bars and the rigid counter-elements are configured in the form of cylinder wall segments and are arranged concentrically.

11. The projection exposure apparatus of claim 1, wherein the thermal conduction elements comprise a material selected from the group consisting of silicon, a silicon compound and a metal.

12. The rojection exposure apparatus of claim 1, wherein the mirror can be swivelled about a swivel axis which lies in or at least approximately in a reflection surface of the mirror.

13. The projection exposure apparatus of claim 1, wherein the control device comprises a voltage source configured to electro-statically charge the thermal conduction elements to provide an electrostatic drive.

14. The projection exposure apparatus of claim 1, comprising a sensor device allocated to the control device, wherein the sensor is configured to determine the position of the mirror.

15. The projection exposure apparatus of claim 1, further comprising a radiation source configured to generate light having a wavelength shorter than 25 nm.

16. The projection exposure apparatus of claim 1, wherein the projection exposure apparatus comprises an illumination system and the mirror unit is in the illumination system.

17. The projection exposure apparatus of claim 1, wherein the projection exposure apparatus comprises a projection objective, and the mirror unit is in the projection objective.

18. The projection exposure apparatus of claim 17, further comprising an additional mirror array, comprising:

a base body; and

a plurality of mirror units, each mirror unit comprising;

a mirror;

a control device configured to modify a position of the mirror relative to the base body; and

thermal conduction elements, the thermal conduction elements being connected to the mirror, the thermal conduction elements not contributing to the bearing of the mirror, and the thermal conduction elements extending in a direction of the base body so that heat can be transferred from the thermal conduction elements to the base body, wherein the projection exposure apparatus comprises an illumination system, and the additional mirror array is in the illumination system.

19. A system, comprising:

a mirror array, comprising;

a base body; and

a plurality of mirror units, each mirror unit comprising a mirror and a control device configured to align the mirror relative to the base body, wherein;

the mirror units have thermal conduction elements which do not contribute to the bearing of the mirror,

the mirror units are connected to the mirrors;

the mirror units extend in a direction of the base body so that heat can be transferred from the thermal conduction elements to the base body; and

the system is selected from the group consisting of a microlithographic illumination system or a microlithographic projection objective.

20. The system of claim 19, wherein the system is a microlithographic illumination system.

21. The system of claim 19, wherein the system is a microlithographic projection objective.