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MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

  • US 20110181852A1
  • Filed: 03/21/2011
  • Published: 07/28/2011
  • Est. Priority Date: 09/30/2008
  • Status: Active Grant
First Claim
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1. A projection exposure apparatus, comprising:

  • a mirror array, comprising;

    a base body; and

    a plurality of mirror units, each mirror unit comprising;

    a mirror;

    a control device configured to modify a position of the mirror relative to the base body; and

    thermal conduction elements, the thermal conduction elements being connected to the mirror, the thermal conduction elements not contributing to the bearing of the mirror, and the thermal conduction elements extending in a direction of the base body so that heat can be transferred from the thermal conduction elements to the base body,wherein the projection exposure apparatus is a microlithographic projection exposure apparatus.

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