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Methods Of Forming Patterns, And Methods For Trimming Photoresist Features

  • US 20110183269A1
  • Filed: 01/25/2010
  • Published: 07/28/2011
  • Est. Priority Date: 01/25/2010
  • Status: Abandoned Application
First Claim
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1. A method for trimming a photoresist feature comprising exposing said photoresist feature to a mixture containing chloroform and an oxidant.

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