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GAS SHOWER STRUCTURE AND SUBSTRATE PROCESSING APPARATUS

  • US 20110186229A1
  • Filed: 02/03/2011
  • Published: 08/04/2011
  • Est. Priority Date: 02/04/2010
  • Status: Active Grant
First Claim
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1. A gas shower structure that is provided to face a substrate within a processing chamber and supplies a processing gas to the substrate as in a shower device, the structure comprising:

  • a plate-shaped member disposed so as to be exposed to a processing atmosphere and having a plurality of gas discharge holes;

    a base member stacked on and press-connected to the plate-shaped member and having gas discharge holes at positions corresponding to positions of the gas discharge holes of the plate-shaped member;

    a joining member for press-connecting the plate-shaped member sandwiched between the joining member and the base member to the base member; and

    a press-connecting elastic member interposed between the joining member and a surface of the plate-shaped member on the side of the processing atmosphere, and deformed to have an elastic restoring force when the joining member approaches the plate-shaped member,wherein the plate-shaped member is press-connected to the base member by the elastic restoring force of the elastic member, anda gap is formed between the joining member and the surface of the plate-shaped member on the side of the processing atmosphere.

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