DEVICE AND METHOD FOR FABRICATING DISPLAY DEVICE

• US 20110189380A1
• Filed: 10/01/2010
• Published: 08/04/2011
• Est. Priority Date: 02/02/2010
• Status: Active Grant

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung Mobile Display Company Limited (Samsung Electronics Co. Ltd.)
• Inventors: Kang, Eu-Gene, Hwang, Min-Jeong, Lee, Joo-Hwa, Jang, Won-Hyouk
• Granted Patent: US 8,899,174 B2
• Time in Patent Office: Days
• US Class Current: 427/10
• CPC Class Codes: B05C 11/00 Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00 means for manipulating or holding work B05C13/00; enclosures for apparatus, booths B05C15/00; spray booths B05B16/00
• CPC Class Codes: C23C 14/12 Organic material
• CPC Class Codes: C23C 14/243 Crucibles for source material C23C14/28, C23C14/30 take precedence
• CPC Class Codes: C23C 14/54 Controlling or regulating the coating process
• CPC Class Codes: C23C 14/545 using measurement on deposited material
• CPC Class Codes: C23C 14/547 using optical methods
• CPC Class Codes: C23C 16/00 Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes reactive sputtering or vacuum evaporation C23C14/00
• CPC Class Codes: C23C 16/44 characterised by the method of coating C23C16/04 takes precedence
• CPC Class Codes: C23C 16/448 characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
• CPC Class Codes: C23C 16/52 Controlling or regulating the coating process C23C16/45557, C23C16/279 take precedence

Abstract

A device for manufacturing a display device includes a deposition source; a deposition thickness calculator for calculating a deposition thickness of a deposition material deposited on a substrate; and a controller for controlling a power of a heater which heats the deposition source by comparing the deposition thickness calculated with a reference thickness. The controller controls the power of the heater either at least one time for each substrate on which the thin film is to be deposited or at regular intervals while the deposition material is deposited. Influence of measurement noise that is included in a quartz crystal sensor for measuring a deposition speed may be minimized, and distribution of deposition thickness of an organic light emitting material may be reduced, thereby increasing the yield of the deposition process and producing quality display devices.

Claims

1. A device for manufacturing a display device, comprising:

a deposition source;

a deposition thickness calculator making determination of a deposition thickness of a deposition material deposited on a substrate, and the deposition material being provided by the deposition source; and

a controller controlling a power of a heater which heats the deposition source by comparing the deposition thickness determined with a reference thickness, and the controller controlling the power of the heater either once when each substrate is loaded into a deposition chamber or at regular intervals during each period while the deposition material is deposited on the substrate.

2. The device of claim 1, further including a deposition speed measuring sensor for measuring a vapor volume of the deposition material that is sublimated from the deposition source with the deposition material filling the deposition chamber.

3. The device of claim 2, wherein the deposition speed measuring sensor comprises a quartz crystal sensor.

4. The device of claim 2, further including a deposition rate calculator providing a representation of a deposition speed of the deposition material by using the measured vapor volume of the deposition material.

5. The device of claim 4, wherein the deposition thickness calculator makes the determination of the deposition thickness of the deposition material by using a function of both the deposition speed of the deposition material determined and time.

6. The device of claim 1, further including a deposition thickness measurer irradiating light to a pattern of a thin film that is deposited onto the substrate, receiving the light reflected by the pattern of the thin film, and measuring a polarization state of the light reflected.

7. The device of claim 6, wherein the deposition thickness measurer is an ellipsometer.

8. The device of claim 6, wherein the deposition thickness measurer comprises:

a photo-irradiator disposed to irradiate light to the pattern of a thin film that is deposited on the substrate; and

a photo-receiver disposed to receive the reflected light and measuring the polarization state of the light reflected.

9. The device of claim 8, wherein the photo-irradiator irradiates light at regular intervals while the deposition material is deposited.

10. The device of claim 8, wherein the deposition thickness calculator calculates deposition thickness from the polarization state of the light reflected.

11. A method for manufacturing a display device, the method comprising steps of:

loading a substrate into a deposition chamber;

forming a thin film by depositing a deposition material on the substrate;

making a determination of a deposition speed of the depositing the deposition material;

making a determination of a deposition thickness of the deposition material by using a function of both the deposition speed measured and time; and

controlling application of power to a deposition source heater which heats a deposition source by adjusting the application of power to deposition source heater on a basis of a comparison between the deposition thickness determined and a reference thickness.

12. The method of claim 11, comprised of making the comparison and adjusting the application of power to the deposition source heater every time a deposition process in which the substrate is loaded into the deposition chamber to form the thin film.

13. The method of claim 11, wherein the step of the determination of the deposition speed comprises:

measuring a vapor volume of the deposition material on a basis of a resonant frequency of a quartz crystal; and

calculating the deposition speed of the deposition material on a basis of the vapor volume of the deposition material.

14. A method for manufacturing a display device, the method comprising steps of:

loading a substrate into a deposition chamber;

forming a thin film by depositing a deposition material on a surface of the substrate;

making a determination of deposition thickness at regular intervals during each period while the deposition material is disposed on the substrate; and

controlling application of power to a deposition source heater which heats a deposition source by adjusting the application of power to the deposition source heater on a basis of a comparison between the deposition thickness determined and a reference thickness.

15. The method of claim 14, wherein the step of making the determination of the deposition thickness comprises:

periodically irradiating light onto a random pattern of the thin film;

measuring a polarization state of light reflected from the random pattern of the thin film; and

calculating the deposition thickness from the polarization state.