TABLE FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS

• US 20110192540A1
• Filed: 02/22/2011
• Published: 08/11/2011
• Est. Priority Date: 03/26/2007
• Status: Abandoned Application

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Matsuyama, Shoichiro, Matsuura, Atsushi, Higuma, Masakazu, Himori, Shinji
• Application Number:
  US13/032,360
• Publication Number:
  US 20110192540A1
• Time in Patent Office: Days
• US Class Current: 156/345.33
• CPC Class Codes: H01J 2237/2001 Maintaining constant desired temperature
• CPC Class Codes: H01J 37/32532 Electrodes
• CPC Class Codes: H01L 21/6831 using electrostatic chucks

Abstract

An object of the present invention is to suppress damage of an electrostatic chuck, by controlling stress exerted on each part of a table, which includes an electrically conductive material, i.e., an electrode for generating plasma, a dielectric layer for enhancing the in-plane uniformity of a plasma process, and an electrostatic chuck. The table for a plasma processing apparatus includes an electrically conductive member connected with a high frequency power source and adapted for plasma generation, for drawing ions present in the plasma, or for both thereof; a dielectric layer provided on a top face of the electrically conductive member, having a central portion and a peripheral portion that are different in thickness relative to each other, and adapted for providing uniformity of high frequency electric field intensity in a plane over the substrate to be processed; and an electrode film for an electrostatic chuck, provided in the dielectric layer and adapted for electrostatically chucking the substrate onto a top face of the dielectric layer. With such configuration, the stress exerted on the electrostatic chuck due to temperature change can be controlled.

Claims

1. A table for a plasma processing apparatus, used for supporting a substrate to be processed thereon, the table comprising:

an electrically conductive member connected with a high frequency power source and adapted for plasma generation, for drawing ions present in the plasma, or for both of plasma generation and drawing ions;

a dielectric layer provided on a top face of the electrically conductive member, having a central portion and a peripheral portion that are different in thickness relative to each other, and adapted for providing uniformity of high frequency electric field intensity in a plane over the substrate to be processed; and

an electrode film of an electrostatic chuck, provided in the dielectric layer and adapted for electrostatically chucking the substrate onto a top face of the dielectric layer.

2. The table for the plasma processing apparatus according to claim 1, wherein the dielectric layer includes a projection, which projects downward such that its thickness of the central portion is greater than its thickness of the peripheral portion.

3. The table for the plasma processing apparatus according to claim 1, wherein the dielectric layer and the electrode film are formed of sprayed materials, respectively.

4. The table for the plasma processing apparatus according to claim 3, the dielectric layer is configured such that the whole body thereof is formed of the same sprayed material.

12. The table for the plasma processing apparatus according to claim 1, wherein the electrode film is composed of a high resistance material.

5-11. -11. (canceled)

13. (canceled)

14. A plasma processing apparatus comprising:

a processing vessel adapted to provide a plasma process to a substrate to be processed;

a processing gas introducing unit for introducing a processing gas into the processing vessel;

a table for the plasma processing apparatus, provided in the processing vessel;

an upper electrode provided above the table such that it faces the table; and

a means configured to evacuate the interior of the processing vessel,

wherein the table includes;

an electrically conductive member connected with a high frequency power source and adapted for plasma generation, for drawing ions present in the plasma, or for both of plasma generation and drawing irons;

a dielectric layer provided on a top face of the electrically conductive member, having a central portion and a peripheral portion that are different in thickness relative to each other, and adapted for providing uniformity of high frequency electric field intensity in a plane over the substrate to be processed; and

an electrode film of an electrostatic chuck, provided in the dielectric layer and adapted for electrostatically chucking the substrate onto a top face of the dielectric layer.

15-16. -16. (canceled)