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PIXEL STRUCTURE, METHOD OF FABRICATING THE SAME, AND METHOD OF FABRICATING ELECTRONIC DEVICE

  • US 20110193089A1
  • Filed: 04/01/2010
  • Published: 08/11/2011
  • Est. Priority Date: 02/10/2010
  • Status: Abandoned Application
First Claim
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1. A pixel structure, comprising:

  • a substrate;

    a gate, disposed on the substrate;

    an insulation layer, covering the gate;

    a metal oxide semiconductor (MOS) layer, disposed on the insulation layer above the gate;

    a source and a drain, disposed on the MOS layer;

    at least one film layer, covering the MOS layer, wherein the film layer comprises a photocatalytic material, and the photocatalytic material blocks a ultraviolet light from reaching the MOS layer; and

    a first electrode layer, electrically connected to the source or the drain.

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