ANTI-ARC ZERO FIELD PLATE
First Claim
1. A vacuum processing chamber, comprising:
- a backing plate disposed in a chamber body;
a showerhead disposed in the chamber body and coupled to the backing plate;
one or more showerhead suspensions electrically coupling the backing plate to the showerhead;
an electrically conductive bracket coupled to the backing plate and spaced apart from the showerhead suspension, the electrically conductive bracket comprising a plate positioned substantially perpendicular to a face of the showerhead; and
an electrical isolator having a first side contacting the plate of the electrically conductive bracket and a second side contacting the chamber body.
1 Assignment
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Accused Products
Abstract
Embodiments of the present invention generally relate to apparatus for reducing arcing and parasitic plasma in substrate processing chambers. The apparatus generally include a processing chamber having a substrate support, a backing plate, and a showerhead disposed therein. A showerhead suspension electrically couples the backing plate to the showerhead. An electrically conductive bracket is coupled to the backing plate and spaced apart from the showerhead. The electrically conductive bracket may include a plate, a lower portion, an upper portion, and a vertical extension. The electrically conductive bracket contacts an electrical isolator.
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Citations
19 Claims
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1. A vacuum processing chamber, comprising:
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a backing plate disposed in a chamber body; a showerhead disposed in the chamber body and coupled to the backing plate; one or more showerhead suspensions electrically coupling the backing plate to the showerhead; an electrically conductive bracket coupled to the backing plate and spaced apart from the showerhead suspension, the electrically conductive bracket comprising a plate positioned substantially perpendicular to a face of the showerhead; and an electrical isolator having a first side contacting the plate of the electrically conductive bracket and a second side contacting the chamber body. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A processing chamber, comprising:
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a chamber body; a chamber lid positioned on the chamber body; a backing plate coupled to the chamber lid; a showerhead coupled to the backing plate; an electrically conductive bracket coupled to the backing plate and spaced apart from the showerhead, the electrically conductive bracket comprising; a plate positioned substantially perpendicular to a face of the showerhead; a lower portion coupled to a bottom edge of the plate, the lower portion substantially perpendicular to the plate; and an upper portion extending from the plate and positioned parallel with the lower portion; a first electrical isolator comprising polytetrafluoroethylene positioned proximate to the backing plate, the chamber body, and the showerhead, the electrical isolator having a first side contacting the chamber body and a second side contacting the plate of the electrically conductive bracket. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17)
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18. A processing chamber, comprising:
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a chamber body; a lid disposed on the chamber body; a showerhead disposed in the chamber body; an electrically conductive bracket electrically coupled to the showerhead, the electrically conductive bracket disposed laterally outward of the showerhead and in a spaced apart relation to the showerhead; and an electrical insulator disposed against the electrically conductive bracket, the electrical insulator positioned laterally outward of the electrically conductive bracket, the electrical insulator in contact with the chamber body. - View Dependent Claims (19)
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Specification