PROCESS CHAMBER GAS FLOW IMPROVEMENTS

• US 20110198417A1
• Filed: 02/09/2011
• Published: 08/18/2011
• Est. Priority Date: 02/12/2010
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: SCHAUER, RONALD VERN, DETMAR, STANLEY, WEST, BRIAN T.
• Granted Patent: US 8,828,182 B2
• Time in Patent Office: Days
• US Class Current: 239/569
• CPC Class Codes: H01J 2237/334 Etching
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32449 Gas control, e.g. control of the gas flow

Abstract

Embodiments of the present invention generally provide plasma etch process chamber improvements. An improved gas injection nozzle is provided for use at a central location of the lid of the chamber. The gas injection nozzle may be used in an existing plasma etch chamber and is configured to provide a series of conic gas flows across the surface of a substrate positioned within the chamber. In one embodiment, an improved exhaust kit for use in the plasma etch chamber is provided. The exhaust kit includes apparatus that may be used in an existing plasma etch chamber and is configured to provide annular flow of exhaust gases from the processing region of the chamber.

Claims

1. A kit for use in a processing chamber, comprising:

a gas injection nozzle having a plurality of adjustable stacked annular gas delivery gaps;

an annular flow control member having an upper convex portion extending downwardly into a lower concave portion, wherein the annular flow control member has an opening extending therethrough having a diameter greater than about 200 mM.

2. The kit of claim 1, wherein the gas injection nozzle comprises:

a plurality of tubes concentrically arranged to provide a plurality of annular gas channels therethrough; and

a plurality of dispersion members arranged to provide the plurality of annular gaps in fluid communication with the plurality of gas channels.

3. The kit of claim 2, wherein at least one of the plurality of dispersion members is movably engaged with at least one of the plurality of tubes.

4. The kit of claim 2, wherein at least one of the plurality of dispersion members has one or more orifices disposed therethrough in fluid communication with at least one of the plurality of annular gas channels.

5. The kit of claim 1, wherein the gas injection nozzle comprises:

a nozzle body having a plurality of gas passages therethrough;

a plurality of dispersion members arranged to provide the plurality of annular gaps; and

a plurality of gasket members having one or more slots formed therein positioned to fluidly couple the gas passages with the annular gaps.

6. The kit of claim 5, wherein at least one of the gaskets is positioned between at least two of the dispersion members.

7. The kit of claim 6, wherein the gas injection nozzle further comprises a central rod disposed therethrough and coupled to the plurality of gaskets.

8. The kit of claim 7, wherein gas flow through the gas injection nozzle is adjusted by rotating the central rod.

9. A process gas injection nozzle, comprising:

a backing member;

a first tube coupled to the backing member;

a second tube concentrically positioned within the first tube to form a first annular flow channel between the second tube and the first tube; and

a first dispersion member coupled to the second tube such that a first annular gap is disposed between the first tube and the first dispersion member.

10. The nozzle of claim 9, wherein the first annular gap is adjustable.

11. The nozzle of claim 10, further comprising:

a third tube concentrically positioned within the second tube to form a second annular flow channel between the third tube and the second tube; and

a second dispersion member coupled to the second tube.

12. The nozzle of claim 11, wherein a second annular gap is formed between the first dispersion member and the second dispersion member, wherein the second annular gap is in fluid communication with the second annular flow channel.

13. The nozzle of claim 12, wherein the second annular gap is adjustable.

14. The nozzle of claim 13, further comprising:

a fourth tube concentrically positioned within the third tube to form a third annular flow channel between the fourth tube and the third tube; and

a third dispersion member coupled to the third tube.

15. The nozzle of claim 14, wherein a third annular gap is formed between the second dispersion and the third dispersion member, wherein the third annular gap is in fluid communication with the third annular flow channel.

16. The nozzle of claim 15, wherein the third annular gap is adjustable.

17. A process gas injection nozzle, comprising:

a nozzle body having a plurality of gas passages therethrough;

a plurality of dispersion members arranged to provide a plurality of annular gaps; and

a plurality of gasket members having one or more slots formed therein positioned to fluidly couple the gas passages with the annular gaps.

18. The nozzle of claim 17, wherein at least one of the gaskets is positioned between at least two of the dispersion members.

19. The nozzle of claim 18, wherein the gas injection nozzle further comprises a central rod disposed therethrough and coupled to the plurality of gaskets.

20. The nozzle of claim 19, wherein gas flow through the gas injection nozzle is adjusted by rotating the central rod.