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REACTIVE SITE DEACTIVATION AGAINST VAPOR DEPOSITION

  • US 20110198736A1
  • Filed: 02/17/2010
  • Published: 08/18/2011
  • Est. Priority Date: 02/17/2010
  • Status: Active Grant
First Claim
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1. A method of processing, comprising:

  • providing an exposed surface;

    supplying a first organic precursor having a first molecular chain length to adsorb a self-assembled monolayer over the exposed surface; and

    supplying a second organic precursor having a second molecular chain length that is shorter than the first molecular chain length to adsorb onto reactive sites of the exposed surface on which a self-assembled monolayer is not adsorbed.

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