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GAS INJECTION SYSTEM FOR ETCHING PROFILE CONTROL

  • US 20110203735A1
  • Filed: 02/23/2011
  • Published: 08/25/2011
  • Est. Priority Date: 02/23/2010
  • Status: Abandoned Application
First Claim
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1. A gas injection system for etching profile control, the system comprising:

  • a top gas injector for supplying a reaction gas at a top of a chamber; and

    a side gas injector having a plurality of jets formed in a radial shape such that a tuning gas is simultaneously jetted in a plurality of positions along an inner circumference of the chamber, and having guidance ducts each connected and installed at one ends of the jets such that the tuning gas is jetted adjacently to an edge part of a wafer loaded inside the chamber.

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