FOCUS TEST MASK, FOCUS MEASUREMENT METHOD, EXPOSURE METHOD AND EXPOSURE APPARATUS
First Claim
1. A focus test mask comprising a test pattern which is to be projected onto an object via a projection optical system,wherein the test pattern includes:
- a first light shielding portion which extends in a line form in a first direction and which shields a light;
a first phase shift portion which is provided on one side of the first light shielding portion in relation to a second direction perpendicular to the first direction, which extends in a line form in the first direction, which is formed to have a line width in relation to the second direction narrower than a line width of the first light shielding portion, and which changes a phase of the light transmitted therethrough;
a first transmitting portion which is provided on the other side of the first light shielding portion in relation to the second direction, which extends in a line form in the first direction, which is formed to have a line width in relation to the second direction narrower than the line width of the first light shielding portion, and through which the light is transmitted; and
a second phase shift portion which is provided on a side of the first transmitting portion opposite to the first light shielding portion in relation to the second direction, which is formed to have a line width in relation to the second direction wider than the first transmitting portion, and which changes the phase of the light transmitted therethrough.
1 Assignment
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Accused Products
Abstract
A focus test reticle for measuring focus information includes an outer pattern. The outer pattern has a line pattern composed of a light shielding film extending in the Y direction, a phase shift portion provided on a side in the +X direction of the line pattern and formed to have a line width narrower than the line pattern, a transmitting portion provided on a side in the −X direction of the line pattern and formed to have a line width narrower than the line pattern, a transmitting portion provided on a side in the +X direction of the phase shift portion, and a phase shift portion provided on a side in the −X direction of the transmitting portion. Focus information of a projection optical system is measured at a high measuring reproducibility and a high measuring efficiency.
26 Citations
25 Claims
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1. A focus test mask comprising a test pattern which is to be projected onto an object via a projection optical system,
wherein the test pattern includes: -
a first light shielding portion which extends in a line form in a first direction and which shields a light; a first phase shift portion which is provided on one side of the first light shielding portion in relation to a second direction perpendicular to the first direction, which extends in a line form in the first direction, which is formed to have a line width in relation to the second direction narrower than a line width of the first light shielding portion, and which changes a phase of the light transmitted therethrough; a first transmitting portion which is provided on the other side of the first light shielding portion in relation to the second direction, which extends in a line form in the first direction, which is formed to have a line width in relation to the second direction narrower than the line width of the first light shielding portion, and through which the light is transmitted; and a second phase shift portion which is provided on a side of the first transmitting portion opposite to the first light shielding portion in relation to the second direction, which is formed to have a line width in relation to the second direction wider than the first transmitting portion, and which changes the phase of the light transmitted therethrough. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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Specification