LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
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Accused Products
Abstract
A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
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Citations
40 Claims
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1-20. -20. (canceled)
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21. An apparatus, comprising:
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a substrate table arranged to hold a substrate during exposure in an immersion lithographic apparatus; and a cover plate, physically separate from the substrate table, positioned radially outside of the substrate during exposure, the cover plate configured to provide a surface, facing a projection system of the immersion lithographic apparatus, that is substantially adjacent to and level with the substrate, wherein the cover plate, a surface of the substrate table under the cover plate, or both, has a reflective surface. - View Dependent Claims (22, 23, 24, 25, 26, 27)
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28. A device manufacturing method, comprising:
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projecting a modulated radiation beam, through a liquid, onto a substrate held on a substrate table, the substrate table having a cover plate physically separate from the substrate table and positioned radially outside of the substrate during exposure, the cover plate providing a surface that is substantially adjacent to and level with a surface of the substrate onto which the modulated radiation beam is incident; and reducing a heat transfer to or from the cover plate using a reflective surface of the cover plate, of a surface of the substrate table under the cover plate, or both. - View Dependent Claims (29, 30, 31, 32, 33)
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34. An apparatus, comprising:
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a substrate table to hold a substrate; a projection system to project a modulated radiation beam onto the substrate; a liquid supply system to provide a liquid in a region between the projection system and the substrate table during exposure; and a cover plate physically separate and removable from the substrate table, the cover plate, positioned radially outside of the substrate during exposure and providing a surface facing the projection system that is substantially level with and adjacent to the substrate when supported by the substrate table; a thermal insulator to reduce heat transfer to or from the cover plate. - View Dependent Claims (35, 36, 37, 38, 39, 40)
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Specification