ATOMIC LAYER DEPOSITION CHAMBER WITH MULTI INJECT
First Claim
1. A chamber lid assembly comprising:
- a channel having an upper portion and a lower portion, wherein the channel extends along a central axis;
a housing having an inner region and at least partially defining two or more annular channels;
an insert disposed in the inner region and defining the upper portion, the upper portion fluidly coupled with the two or more annular channels; and
a tapered bottom surface extending from the bottom portion of the channel to a peripheral portion of the chamber lid assembly.
1 Assignment
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Accused Products
Abstract
Embodiments of the invention relate to apparatus and methods for depositing materials on substrates during atomic layer deposition processes. In one embodiment, a chamber lid assembly comprises a channel having an upper portion and a lower portion, wherein the channel extends along a central axis, a housing having an inner region and at least partially defining two or more annular channels, an insert disposed in the inner region and defining the upper portion, the upper portion fluidly coupled with the two or more annular channels, and a tapered bottom surface extending from the bottom portion of the channel to a peripheral portion of the chamber lid assembly.
388 Citations
20 Claims
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1. A chamber lid assembly comprising:
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a channel having an upper portion and a lower portion, wherein the channel extends along a central axis; a housing having an inner region and at least partially defining two or more annular channels; an insert disposed in the inner region and defining the upper portion, the upper portion fluidly coupled with the two or more annular channels; and a tapered bottom surface extending from the bottom portion of the channel to a peripheral portion of the chamber lid assembly. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A method of processing a substrate, comprising:
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flowing two or more process gases from one or more fluid sources through fluid delivery lines of a chamber lid assembly; flowing the two or more process gases from the fluid delivery lines through two or more annular channels at least partially defined by a housing of the chamber lid assembly, the housing having an inner region; flowing the two or more process gases from the two or more annular channels through an insert disposed in the inner region and into an upper portion of a channel in the chamber lid assembly, the insert defining the upper portion of the channel; and flowing the one or more process gases through the channel and into a reaction zone above a substrate disposed on a substrate support.
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Specification