BOTTOM ELECTRODES FOR USE WITH METAL OXIDE RESISTIVITY SWITCHING LAYERS
First Claim
Patent Images
1. A metal-insulator-metal (MIM) stack comprising:
- a first conductive layer comprising a first metal-silicide layer and a second metal-silicide layer;
a resistivity-switching layer comprising a metal oxide layer formed above the first conductive layer; and
a second conductive layer formed above the resistivity-switching layer.
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Abstract
In a first aspect, an MIM stack is provided that includes (1) a first conductive layer comprising a first metal-silicide layer and a second metal-silicide layer; (2) a resistivity-switching layer comprising a metal oxide layer formed above the first conductive layer; and (3) a second conductive layer formed above the resistivity-switching layer. A memory cell may be formed from the MIM stack. Numerous other aspects are provided.
297 Citations
35 Claims
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1. A metal-insulator-metal (MIM) stack comprising:
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a first conductive layer comprising a first metal-silicide layer and a second metal-silicide layer; a resistivity-switching layer comprising a metal oxide layer formed above the first conductive layer; and a second conductive layer formed above the resistivity-switching layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method of forming a metal-insulator-metal (MIM) stack comprising:
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forming a first conductive layer comprising a first metal-silicide layer and a second metal-silicide layer; forming a resistivity-switching layer comprising a metal oxide layer above the first conductive layer; and forming a second conductive layer above the resistivity-switching layer. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21)
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22. A metal-insulator-metal (MIM) stack comprising:
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a first metal-silicide layer formed at a first temperature; a second metal-silicide layer formed above the first metal-silicide layer and at a second temperature that is greater than the first temperature; an n+ silicon or SiGe layer formed above the second metal-silicide layer; a resistivity-switching layer comprising a metal oxide layer formed above the n+ silicon or SiGe layer; and a second conductive layer formed above the resistivity-switching layer. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29)
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30. A method of forming a metal-insulator-metal (MIM) stack comprising:
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forming a first metal-silicide layer at a first temperature; forming a second metal-silicide layer above the first metal-silicide layer at a second temperature that is greater than the first temperature; forming an n+ silicon or SiGe layer above the second metal-silicide layer; forming a resistivity-switching layer comprising a metal oxide layer above the n+ silicon or SiGe layer; and forming a second conductive layer above the resistivity-switching layer. - View Dependent Claims (31, 32, 33, 34, 35)
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Specification