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SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

  • US 20110233198A1
  • Filed: 03/21/2011
  • Published: 09/29/2011
  • Est. Priority Date: 03/25/2010
  • Status: Abandoned Application
First Claim
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1. A substrate processing apparatus comprising:

  • a process chamber for processing a substrate;

    a substrate holder installed in the process chamber to hold the substrate;

    a gas introduction part installed below the substrate held by the substrate holder for introducing a gas toward a back surface of the substrate; and

    an electromagnetic wave introduction part installed over the substrate held by the substrate holder for introducing an electromagnetic wave.

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