SEMICONDUCTOR APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD OF DESIGNING SEMICONDUCTOR APPARATUS, AND ELECTRONIC APPARATUS
First Claim
Patent Images
1. A semiconductor device comprising:
- a first material layer adjacent to a second material layer;
a first via passing through the first material layer and extending into the second material layer; and
a second via extending into the first material layer,wherein,along a common cross section parallel to an interface between the two material layers, the first via has a cross section larger than that of the second via.
1 Assignment
0 Petitions
Accused Products
Abstract
A semiconductor device including a first material layer adjacent to a second material layer, a first via passing through the first material layer and extending into the second material layer, and a second via extending into the first material layer, where along a common cross section parallel to an interface between the two material layers, the first via has a cross section larger than that of the second via.
147 Citations
29 Claims
-
1. A semiconductor device comprising:
-
a first material layer adjacent to a second material layer; a first via passing through the first material layer and extending into the second material layer; and a second via extending into the first material layer, wherein, along a common cross section parallel to an interface between the two material layers, the first via has a cross section larger than that of the second via. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
-
-
14. A method of manufacturing a semiconductor device including the steps of:
-
forming a first material layer with a first surface and a second surface; forming a second material layer with a first surface and a second surface; securing the second surface of the first material layer against the first surface of the second material layer; and forming a first via and a second via simultaneously, wherein, along a common cross section parallel to an interface between the two material layers, the first via has a cross section larger than that of the second via. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
-
-
28. A solid state imaging device comprising:
-
a first material layer adjacent to a second material layer; a first via passing through the first material layer and extending into the second material layer; and a second via extending into the first material layer, wherein, along a common cross section parallel to an interface between the two material layers, the first via has a cross section larger than that of the second via.
-
-
29. An electronic apparatus comprising:
-
a first material layer adjacent to a second material layer; a first via passing through the first material layer and extending into the second material layer; and a second via extending into the first material layer, wherein, along a common cross section parallel to an interface between the two material layers, the first via has a cross section larger than that of the second via.
-
Specification