CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN

• US 20110236595A1
• Filed: 12/02/2009
• Published: 09/29/2011
• Est. Priority Date: 12/03/2008
• Status: Active Grant

• Current Assignee: Fujifilm Corporation (Fujifilm Holdings Corporation)
• Original Assignee: Fujifilm Corporation (Fujifilm Holdings Corporation)
• Inventors: Yonezawa, Hiroyuki, Sakita, Kyouhei, Kodama, Kunihiko
• Granted Patent: US 8,883,065 B2
• Time in Patent Office: Days
• US Class Current: 427/553
• CPC Class Codes: B05D 5/00 Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
• CPC Class Codes: B29C 59/005 characterised by the choice of material
• CPC Class Codes: B29K 2033/04 Polymers of esters
• CPC Class Codes: B29K 2105/0085 Copolymers
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: C08F 2/48 by ultraviolet or visible light
• CPC Class Codes: C08F 220/1809 C9-(meth)acrylate
• CPC Class Codes: C09D 4/00 Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
• CPC Class Codes: G03F 7/004 Photosensitive materials G03F7/12, G03F7/14 take precedence

Abstract

Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.

Claims

1. A curable composition for imprints comprising a polymerizable monomer (Ax) and a photopolymerization initiator, wherein the polymerizable monomer (Ax) is represented by the following formula (I);

2. The curable composition for imprints according to claim 1, wherein Z in the formula (I) represents —

Z¹—

Z²;

wherein Z¹ is a single bond, or a hydrocarbon group which may have a linking group containing a hetero atom in the chain of the linking group;

Z² is an aromatic group having a molecular weight of 90 or more; and

Z² may have a substituent.

3. The curable composition for imprints according to claim 1, wherein the polymerizable monomer (Ax) is a compound represented by the following formula (II);

4. The curable composition for imprints according to claim 1, wherein the polymerizable monomer (Ax) is a compound represented by the following formula (III);

5. The curable composition for imprints according to claim 1, wherein the polymerizable monomer (Ax) is a compound represented by the following formula (IV);

6. The curable composition for imprints according to claim 5, wherein, in the formula (IV), R¹ is a hydrogen atom, or a methyl group;

X² is a single bond, or a hydrocarbon group having 1 to 3 carbon atoms;

n² is an integer of 0 to 2; and

, when n2 is 2, X² is a hydrocarbon group having one carbon atom.

7. The curable composition for imprints according to claim 5, wherein the compound represented by the formula (IV) has a molecular weight of 175 to 250.

8. The curable composition for imprints according to claim 5, wherein the compound represented by the formula (IV) has a viscosity of 6 mPa·

s or less at 25°

C.

9. The curable composition for imprints according to claim 1, wherein the polymerizable monomer (Ax) is a compound represented by the following formula (V);

10. The curable composition for imprints according to claim 9, wherein R¹ is a hydrogen atom, or an alkyl group, and X³ is a single bond, or an alkylene group.

11. The curable composition for imprints according to claim 1, wherein the polymerizable monomer (Ax) is a compound represented by the following formula (VI);

12. The curable composition for imprints according to claim 11, wherein X⁴ and X⁵ in the formula (VI) each are an alkylene group, the alkylene group being free from a linking group.

13. The curable composition for imprints according to claim 1, which further comprises a polymerizable monomer different from the polymerizable monomer (Ax).

14. The curable composition for imprints according to claim 13, wherein the polymerizable monomer different from the polymerizable monomer (Ax) is a monofunctional (meth)acrylate having an aromatic structure and/or an alicyclic hydrocarbon structure.

15. The curable composition for imprints according to claim 1, which further comprises a polymerizable compound having a fluorine atom and/or a silicon atom.

16. The curable composition for imprints according to claim 1, which further comprises an antioxidant and/or a surfactant.

17. The curable composition for imprints according to claim 1, which comprises 30% by mass or less of polymerizable monomers having a molecular weight of 2000 or more, relative to the total amount of all the polymerizable monomers contained in the composition.

18. A cured product of the curable composition for imprints according to claim 1.

19. A method for manufacturing a cured product comprising;

applying the curable composition for imprints according to claim 1, onto a substrate to form a patterning layer thereon,

pressing a mold against the surface of the patterning layer, and

irradiating the patterning layer with light.

20. A reaction diluent comprising a compound represented by the following formula (IV);