METHODS FOR PROCESSING SUBSTRATES IN PROCESS SYSTEMS HAVING SHARED RESOURCES
First Claim
1. A method of processing substrates in a twin chamber processing system having a first process chamber, a second process chamber, and shared processing resources, comprising:
- providing a substrate to the first process chamber of the twin chamber processing system, wherein the first process chamber has a first processing volume that is independent from a second processing volume of the second process chamber;
providing one or more processing resources from the shared processing resources to only the first processing volume of the first process chamber; and
performing a process on the substrate in the first process chamber.
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Abstract
Methods for processing substrates in twin chamber processing systems having first and second process chambers and shared processing resources are provided herein. In some embodiments, a method may include providing a substrate to the first process chamber of the twin chamber processing system, wherein the first process chamber has a first processing volume that is independent from a second processing volume of the second process chamber; providing one or more processing resources from the shared processing resources to only the first processing volume of the first process chamber; and performing a process on the substrate in the first process chamber.
130 Citations
16 Claims
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1. A method of processing substrates in a twin chamber processing system having a first process chamber, a second process chamber, and shared processing resources, comprising:
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providing a substrate to the first process chamber of the twin chamber processing system, wherein the first process chamber has a first processing volume that is independent from a second processing volume of the second process chamber; providing one or more processing resources from the shared processing resources to only the first processing volume of the first process chamber; and performing a process on the substrate in the first process chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of processing substrates in a twin chamber processing system having a first process chamber, a second process chamber, and shared processing resources, wherein the shared processing resources comprise at least one of a shared gas panel or a shared vacuum pump, the method comprising:
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providing a substrate to the first process chamber of the twin chamber processing system, wherein the first process chamber has a first processing volume that is independent from a second processing volume of the second process chamber; providing a process gas from a shared gas panel to only the first processing volume of the first process chamber, wherein the process gas bypasses the second process chamber and is diverted to a foreline of the first process chamber; and performing a process on the substrate in the first process chamber.
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10. A computer readable medium, having instructions stored thereon which, when executed, causes a twin chamber processing system having a first process chamber, a second process chamber, and shared processing resources to perform a method, comprising:
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providing a substrate to the first process chamber of the twin chamber processing system, wherein the first process chamber has a first processing volume that is independent from a second processing volume of the second process chamber; providing one or more processing resources from the shared processing resources to only the first processing volume of the first process chamber; and performing a process on the substrate in the first process chamber. - View Dependent Claims (11, 12, 13, 14, 15, 16)
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Specification