Encapsulation of Electrodes in Solid Media for use in conjunction with Fluid High Voltage Isolation
First Claim
Patent Images
1. A charged particle beam system, comprising:
- a plasma source having;
a plasma chamber having a wall composed of a dielectric material, the wall having an interior surface and an exterior surface;
a conductor coiled at least one time around the plasma chamber;
a conductive shield substantially encapsulated in a solid dielectric media, the conductive shield positioned between the plasma chamber and the conductor; and
a source electrode for electrically biasing the plasma to a high voltage; and
one or more focusing lenses for focusing charged particles from the plasma source onto a sample.
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Abstract
An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.
53 Citations
20 Claims
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1. A charged particle beam system, comprising:
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a plasma source having; a plasma chamber having a wall composed of a dielectric material, the wall having an interior surface and an exterior surface; a conductor coiled at least one time around the plasma chamber; a conductive shield substantially encapsulated in a solid dielectric media, the conductive shield positioned between the plasma chamber and the conductor; and a source electrode for electrically biasing the plasma to a high voltage; and one or more focusing lenses for focusing charged particles from the plasma source onto a sample. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A charged particle beam system, comprising:
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a plasma source having; a plasma chamber having a wall composed of a dielectric material, the wall having an interior surface and an exterior surface; a conductor coiled at least one time around the plasma chamber; a static liquid surrounding and in thermal contact with at least a portion of the plasma chamber; and a source electrode for electrically biasing the plasma to a high voltage; and one or more focusing lenses for focusing charged particles from the plasma source onto a sample. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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16. A charged particle beam system, comprising:
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a plasma source having; a plasma chamber having a wall composed of a dielectric material, the wall having an interior surface and an exterior surface; a conductor coiled at least one time around the plasma chamber; a liquid in thermal contact with at least a portion of the plasma chamber, a portion of the liquid being positioned between the plasma chamber and the conductor; a heat pipe cooling device for cooling the fluid; and a source electrode for electrically biasing the plasma to a high voltage; and one or more focusing lenses for focusing charged particles from the plasma source onto a sample. - View Dependent Claims (17, 18, 19, 20)
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Specification