DYNAMIC SUPPORT SYSTEM FOR QUARTZ PROCESS CHAMBER

• US 20110277688A1
• Filed: 04/04/2011
• Published: 11/17/2011
• Est. Priority Date: 05/14/2010
• Status: Active Grant

• Current Assignee: SolarCity Corporation (Tesla Inc.)
• Original Assignee: Silevo, Inc. (Tesla Inc.)
• Inventors: Rozenzon, Yan, Trujillo, Robert T., Beese, Steven C.
• Granted Patent: US 9,240,513 B2
• Time in Patent Office: Days
• US Class Current: 118/715
• CPC Class Codes: C23C 16/44 characterised by the method of coating C23C16/04 takes precedence
• CPC Class Codes: C23C 16/52 Controlling or regulating the coating process C23C16/45557, C23C16/279 take precedence
• CPC Class Codes: F16F 15/0232 with at least one gas spring F16F15/027 takes precedence
• CPC Class Codes: F16F 15/027 comprising control arrangements F16F15/0237 takes precedence
• CPC Class Codes: F16F 15/0275 Control of stiffness
• CPC Class Codes: F16M 11/046 adapted to upward-downward translation movement
• CPC Class Codes: F16M 11/18 with mechanism for moving the apparatus relatively to the stand
• CPC Class Codes: H01L 31/18 Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof

Abstract

One embodiment of the present invention provides a support system for providing dynamic support to a deposition reactor. The system includes a coupling mechanism configured to provide coupling between the deposition reactor and the support system, an attachment mechanism configured to attach the support system to an external frame, and at least one gas bellows situated between the coupling mechanism and the attachment mechanism.

Claims

1. A support system for providing dynamic support to a deposition reactor, comprising:

a coupling mechanism configured to provide coupling between the deposition reactor and the support system;

an attachment mechanism configured to attach the support system to an external frame; and

at least one gas bellows situated between the coupling mechanism and the attachment mechanism.

2. The support system of claim 1, further comprising a pressure regulator configured to regulate the pressure within the gas bellows.

3. The support system of claim 2, wherein the pressure regulator regulates the pressure within the gas bellows by allowing pressurized gas to enter or exit the gas bellows, thereby facilitating a relative position change between the coupling mechanism and the attachment mechanism.

4. The support system of claim 3, wherein the pressurized gas includes inert gas.

5. The support system of claim 1, wherein the support system is situated below the deposition reactor.

6. The support system of claim 1, wherein the support system is situated above the deposition reactor.

7. The support system of claim 1, wherein the coupling mechanism includes a platform that is in contact with one end of the deposition reactor.

8. The support system of claim 1, wherein the attachment mechanism includes a mount bracket comprising a vertical surface and a horizontal surface, wherein the vertical surface is mounted to the external frame, and wherein the horizontal surface is coupled to the gas bellows.

9. A deposition tool, comprising:

an external frame;

a reactor that includes a chamber, at least one gas nozzle, and at least one manifold; and

a dynamic support system coupling together the external frame and the reactor, wherein the dynamic support system comprises;

a coupling mechanism configured to provide coupling between the reactor and the dynamic support system;

an attachment mechanism configured to attach the dynamic support system to an external frame; and

at least one gas bellows situated between the coupling mechanism and the attachment mechanism.

10. The deposition tool of claim 9, wherein the dynamic support system further comprises a pressure regulator configured to regulate the pressure within the gas bellows.

11. The deposition tool of claim 10, wherein the pressure regulator regulates the pressure within the gas bellows by allowing pressurized gas to enter or exit the gas bellows, thereby facilitating a relative position change between the coupling mechanism and the attachment mechanism.

12. The deposition tool of claim 11, wherein the pressurized gas includes inert gas.

13. The deposition tool of claim 9, wherein the dynamic support system is situated below the reactor.

14. The deposition tool of claim 9, wherein the dynamic support system is situated above the reactor.

15. The deposition tool of claim 9, wherein the coupling mechanism includes a platform that is in contact with one end of the reactor.

16. The deposition tool of claim 9, wherein the attachment mechanism includes a mount bracket comprising a vertical surface and a horizontal surface, wherein the vertical surface is mounted to the external frame, and wherein the horizontal surface is coupled to the gas bellows.

17. The deposition tool of claim 9, wherein the chamber is made of a material that includes quartz, and wherein the coupling mechanism is made of a material that includes metal.