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EXPOSURE APPARATUS AND METHODS

  • US 20110292363A1
  • Filed: 07/30/2009
  • Published: 12/01/2011
  • Est. Priority Date: 07/30/2008
  • Status: Active Grant
First Claim
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1. An exposure apparatus for projecting radiation corresponding to a pattern onto a substrate, the exposure apparatus comprising:

  • a wave front control means configured to alter a wave front of the radiation;

    configuration means for configuring the wave front control means based on the pattern and a topography of the substrate; and

    a projection means for projecting the altered wave front onto a substrate.

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