Apparatus And Method For Producing Plasma
First Claim
1. A plasma generation device comprising a first plasma generation chamber which has a gas feed opening and a plasma exit, and a first plasma generation means arranged in a state without exposure to the space within said first plasma generation chamber, and a second plasma generation chamber which has a plasma feed opening and wherein plasma generated at said first plasma generation chamber is supplied through said plasma exit and said plasma feed opening and wherein a second plasma generation means which is arranged in a state without exposure to the space within said second plasma generation chamber.
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Abstract
The plasma generation device comp rising first plasma generation chamber 10 which has gas feed opening 12 and plasma exit 13, and first plasma generation means 11 which is arranged in space of said first plasma generation chamber in state of not exposed, and second plasma generation chamber 20 which has plasma feed opening 22 whereby plasma generated said first plasma generation chamber through said plasma exit, and second plasma generation means 21 which is arranged in space of said second plasma generation chamber in state of not exposed wherever generating higher density than plasma generated by said first plasma generation chamber.
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31 Claims
- 1. A plasma generation device comprising a first plasma generation chamber which has a gas feed opening and a plasma exit, and a first plasma generation means arranged in a state without exposure to the space within said first plasma generation chamber, and a second plasma generation chamber which has a plasma feed opening and wherein plasma generated at said first plasma generation chamber is supplied through said plasma exit and said plasma feed opening and wherein a second plasma generation means which is arranged in a state without exposure to the space within said second plasma generation chamber.
- 16. Plasma generation means wherein a first plasma is generated in a first plasma generating chamber by supplying a first plasma gas and by supplying electric power from a first plasma generation means which is located in said first plasma generation chamber without exposing, and a second plasma is generated in a second plasma generating chamber by supplying a second plasma gas and by supplying electric power from a second plasma generation means which is located in said second plasma generation chamber without exposing, additionally by supplying first plasma generated in said first plasma generation chamber.
Specification