SURFACE GRATINGS ON VCSELS FOR POLARIZATION PINNING

• US 20110306156A1
• Filed: 08/15/2011
• Published: 12/15/2011
• Est. Priority Date: 04/20/2005
• Status: Active Grant

• Current Assignee: II-VI Delaware, Inc. (Coherent Corp.)
• Original Assignee: Finisar Corporation (II-VI Incorporated)
• Inventors: Johnson, Ralph H., Guenter, James K.
• Granted Patent: US 8,455,279 B2
• Time in Patent Office: Days
• US Class Current: 438/32
• CPC Class Codes: H01S 5/18311 using selective oxidation
• CPC Class Codes: H01S 5/18319 comprising a periodical structure in lateral directions
• CPC Class Codes: H01S 5/18355 having a defined polarisation
• CPC Class Codes: H01S 5/18386 Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface

Abstract

Methods for manufacturing a polarization pinned vertical cavity surface emitting laser (VCSEL). Steps include growing a lower mirror on a substrate; growing an active region on the lower mirror; growing an upper mirror on the active region; depositing a grating layer on the upper minor; and etching a grating into the grating layer.

Claims

1. A method of manufacturing a vertical cavity surface emitting laser (VCSEL), the method comprising:

growing a lower mirror on a substrate;

growing an active region on the lower mirror, the active region having one or more quantum wells configured to generate light by stimulated emission;

growing an upper mirror on the active region;

forming an electrical aperture;

depositing a light transmissive grating layer above the aperture; and

etching a grating into the grating layer, the grating configured to pin polarization of light emitted from the active region.

2. The method of claim 1, wherein depositing the light transmissive grating layer comprises:

depositing a low index of refraction layer on the upper mirror; and

depositing a high index of refraction layer formed on the low index of refraction layer.

3. The method of claim 1, wherein depositing the light transmissive grating layer comprises:

depositing a thin low index of refraction layer on the upper minor; and

depositing a thin high index of refraction layer formed on the low index of refraction layer, the high index of refraction layer having an index of refraction that is 0.3 or greater than the index of refraction for the low index of refraction layer.