LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD

• US 20110310373A1
• Filed: 06/17/2011
• Published: 12/22/2011
• Est. Priority Date: 06/18/2010
• Status: Active Grant

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Inventors: SENTOKU, Koichi
• Granted Patent: US 8,618,515 B2
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: G03F 7/2059 using a scanning corpuscular radiation beam, e.g. an electron beam
• CPC Class Codes: G03F 9/7011 Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
• CPC Class Codes: G03F 9/7019 Calibration
• CPC Class Codes: G03F 9/7053 Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
• CPC Class Codes: H01J 2237/24528 Direction of beam or parts thereof in view of the optical axis, e.g. beam angle, angular distribution, beam divergence, beam convergence or beam landing angle on sample or workpiece means for deflecting or directing discharge H01J2237/15
• CPC Class Codes: H01J 2237/2482 Optical means
• CPC Class Codes: H01J 37/3045 Object or beam position registration
• CPC Class Codes: H01J 37/3174 Particle-beam lithography, e.g. electron beam lithography
• CPC Class Codes: H01J 37/3177 Multi-beam, e.g. fly's eye, comb probe

Abstract

A lithography apparatus includes a first measurement device which measures a position of a mark on a substrate with light, a second measurement device which measures a position of a reference mark on a stage with a charged-particle, a detector which detects the position of the stage in a first direction parallel to the axis of a projection system and a second direction perpendicular to this axis, and a controller. The controller determines a charged-particle beam, in which the angle, with respect to the first direction, at which it is incident on the reference mark falls within a tolerance, and obtains a baseline for the first measurement device from the position of the reference mark measured by the second measurement device using the determined charged-particle beam and the position of the reference mark measured by the first measurement device.

Claims

1. A lithography apparatus including a stage which includes a reference mark and configured to hold a substrate, a projection system configured to project a plurality of charged-particle beams onto the substrate, a first measurement device configured to irradiate a mark on the substrate with a light and to detect a light reflected by the mark to measure a position of the mark, a second measurement device configured to irradiate the reference mark with a charged-particle beam via the projection system and to detect a charged-particle beam that reaches the second measurement device from the reference mark to measure a position of the reference mark, and a detector configured to detect a position of the stage in a first direction parallel to an axis of the projection system and a second direction perpendicular to the axis, the apparatus drawing a pattern on the substrate with the plurality of charged-particle beams, the apparatus comprising:

a controller configured to determine, among the plurality of charged-particle beams, a charged-particle beam of which an incident angle, relative to the first direction, on the reference mark falls within a tolerance, and to obtain a baseline of the first measurement device based on a position of the reference mark measured by the second measurement device using the determined charged-particle beam and a position of the reference mark measured by the first measurement device.

2. The apparatus according to claim 1, wherein the controller is configured, with respect to each of at least a part of the plurality of charged-particle beams, to perform a movement of the stage in the first direction, and to obtain the incident angle based on positions of the reference mark respectively measured by the second measurement device before and after the movement.

3. The apparatus according to claim 1, wherein the controller is configured, with respect to each of at least a part of the plurality of charged-particle beams, to perform a movement of the stage in the first direction, and to obtain the incident angle based on positions of the reference mark respectively measured by the second measurement device before and after the movement, and is configured, with respect to each of remaining charged-particle beams of the plurality of charged-particle beams, to estimate the incident angle based on the obtained angles.

4. The apparatus according to claim 1, wherein an upper limit of an absolute value of the incident angle which defines the tolerance is (A/E), where E is a positioning precision of the stage with respect to the movement, and A is a target precision with which the baseline is obtained.

5. A method of manufacturing a device, the method comprising:

drawing a pattern on a substrate using a lithography apparatus defined in claim 1;

developing the substrate on which the pattern has been drawn; and

processing the developed substrate to manufacture the device.