BIAXIAL SCANNING MIRROR FOR IMAGE FORMING APPARATUS AND METHOD FOR OPERATING THE SAME
First Claim
Patent Images
1. A biaxial scanning minor for an image forming apparatus, comprising:
- a first wafer having a plurality of cavities forming a first row and a second row;
a plurality of permanent magnets each installed in one of the plurality of cavities, two adjacent permanent magnets of the same row having an air gap formed therebetween;
a second wafer, comprising;
a minor unit, rotating around a first axis, for reflecting light beams; and
a rotating unit, formed around the minor unit, for rotating the minor unit around a second axis which is perpendicular to the first axis;
at least one coil substrate having a planar coil, assembled in the rotating unit; and
a spacer, formed between the first wafer and the second wafer, for separating the first wafer and the second wafer.
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Abstract
A biaxial scanning minor is disclosed in the present invention. The minor includes: a first wafer having several cavities forming a first row and a second row, several permanent magnets each installed in one of the cavities, a spacer and a second wafer. The second wafer includes: a minor unit, rotating around a first axis, for reflecting light beams; and a rotating unit, formed around the minor unit, for rotating the minor unit around a second axis which is perpendicular to the first axis. At least one coil substrate having a planar coil is assembled in the rotating unit.
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15 Claims
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1. A biaxial scanning minor for an image forming apparatus, comprising:
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a first wafer having a plurality of cavities forming a first row and a second row; a plurality of permanent magnets each installed in one of the plurality of cavities, two adjacent permanent magnets of the same row having an air gap formed therebetween; a second wafer, comprising; a minor unit, rotating around a first axis, for reflecting light beams; and a rotating unit, formed around the minor unit, for rotating the minor unit around a second axis which is perpendicular to the first axis; at least one coil substrate having a planar coil, assembled in the rotating unit; and a spacer, formed between the first wafer and the second wafer, for separating the first wafer and the second wafer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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Specification