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APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION

  • US 20120000422A1
  • Filed: 09/14/2011
  • Published: 01/05/2012
  • Est. Priority Date: 07/03/2008
  • Status: Active Grant
First Claim
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1. A showerhead assembly for a vapor deposition process, comprising:

  • a showerhead plate having a top surface, a bottom surface, and a radius extending from the center to the outer edge of the showerhead plate;

    a first plurality of holes extending through the showerhead plate and in fluid communication with the top surface and the bottom surface, positioned within a first zone extending from the center of the showerhead plate to about 25% of the radius of the showerhead plate, and each hole of the first plurality comprises a diameter of less than 0.1 inches; and

    a second plurality of holes extending through the showerhead plate and in fluid communication with the top surface and the bottom surface, positioned within a second zone extending from about 25% of the radius of the showerhead plate to about the outer edge of the showerhead plate, and each hole of the second plurality comprises a diameter of greater than 0.1 inches.

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