COMMON LINE STRUCTURE AND DISPLAY PANEL AND METHOD OF MAKING THE SAME

• US 20120008081A1
• Filed: 12/16/2010
• Published: 01/12/2012
• Est. Priority Date: 07/08/2010
• Status: Active Grant

• Current Assignee: AU Optronics Corporation
• Original Assignee: AU Optronics Corporation
• Inventors: Tsai, Tung-Chang
• Granted Patent: US 8,471,993 B2
• Time in Patent Office: Days
• US Class Current: 349/139
• CPC Class Codes: G02F 1/134363 for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]

Abstract

A method of forming a common line structure of a display panel includes the following steps. First, provide a substrate, wherein at least one first common section and at least one second common section are disposed on the substrate. Then, form a passivation layer on the substrate, the first common section, and the second common section. Subsequently, form at least one through hole penetrating the passivation layer to at least partially expose the first common section and the second common section. Thereafter, form a connection section on the passivation layer to electrically connect the first common section and the second common section exposed by the through hole.

Claims

1. A method of forming a common line structure, comprising:

providing a substrate, wherein at least one first common section and at least one second common section are disposed on the substrate;

forming a passivation layer on the substrate, on the first common section, and on the second common section;

forming at least one through hole penetrating the passivation layer to partially expose the at least one first common section and the at least one second common section; and

forming a connection section on the passivation layer, wherein the connection section is electrically connected to the at least one first common section and the at least one second common section exposed by the through hole.

2. The method of forming the common line structure according to claim 1, wherein:

the first common section and the second common section are made of a same patterned conducting layer;

the at least one through hole comprises a first through hole and a second through hole, wherein the first through hole partially exposes the first common section, and wherein the second through hole partially exposes the second common section;

the method further comprises forming an insulated layer on the substrate, on the first common section, and on the second section prior to forming the passivation layer, wherein the first through hole penetrates the passivation layer and the insulated layer to partially expose the first common section, and wherein the second through hole penetrates the passivation layer and the insulated layer to partially expose the second common section; and

a sidewall of the insulated layer exposed by the first through hole and a sidewall of the insulated layer exposed by the second through hole respectively have a stair structure, and wherein each of the stair structures comprises a first slanted surface, a flat surface, and a second slanted surface.

3. The method of forming the common line structure according to claim 2, wherein the step of forming the at least one through hole comprises:

forming a patterned photo resist, having an opening, a first area, and a second area, on the passivation layer, wherein the opening partially overlaps the first common section and the second common section in a vertical projection direction, wherein the first area adjoins the opening and does not overlap the first common section and the second section in the vertical projection direction, wherein the second area surrounds the first area and the opening, and wherein a thickness of the first area is thinner than a thickness of the second area; and

using the patterned photo resist as a mask to etch the passivation layer and the insulated layer to form the first through hole, the second through hole, and the stair structures of the insulated layer, wherein the patterned photo resist is formed by using a halftone mask or a gray scale mask.

4. The method of forming the common line structure according to claim 1, wherein the first common section is made of a first patterned conducting layer and the second common section is made of a second patterned conducting layer.

5. The method of forming the common line structure according to claim 4, wherein the at least one through hole comprises a first through hole and a second through hole, wherein the at least one first common section comprises two first common sections, wherein the at least one second common section comprises two second common sections, wherein the first through hole partially exposes one of the two first common sections and one of the two second common sections, and wherein the second through hole partially exposes the other of the two first common sections and the other of the two second common sections.

6. The method of forming the common line structure according to claim 5, further comprising forming an insulated layer on the substrate and on the two first common sections prior to forming the passivation layer and the two second common sections, the first through hole penetrating the passivation and the insulated layer to partially expose one of the two first common sections and one of the two second common sections, and the second through hole penetrating the passivation layer and the insulated layer to partially expose the other of the two first common sections and the other of the two second common sections, wherein a sidewall of the insulated layer exposed by the first through hole and a sidewall of the insulated layer exposed by the second through hole respectively have a first slope, a sidewall of the second common section exposed by the first through hole and a sidewall of the second common section exposed by the second through hole respectively have a second slope, and the second slope is less than the first slope.

7. The method of forming the common line structure according to claim 6, wherein the step of forming the at least one through hole comprises:

forming a patterned photo resist on the passivation layer, the patterned photo resist having an opening, a first area, and a second area, wherein the opening overlaps the two first common sections and does not overlap the two second common sections in a vertical projection direction, the first area adjoins the opening, partially overlaps the two second common sections, and does not overlap the two first common sections in the vertical projection direction, the second area surrounds the first area and the opening, and a thickness of the first area is thinner than a thickness of the second area; and

using the patterned photo resist as a mask to etch the passivation layer and the insulated layer to form the first through hole and the second through hole, wherein the patterned photo resist is formed by using a halftone mask or a gray scale mask.

8. The method of forming the common line structure according to claim 1, wherein the connection section is made of a patterned transparent conducting layer.

9. A method of forming a display panel, comprising:

providing a substrate, wherein a gate line, a gate electrode electrically connected to the gate line, a data line, a source electrode electrically connected to the data line, a drain electrode, at least one first common section, and at least one second common section are disposed on the substrate;

forming a passivation layer on the substrate, on the gate electrode, on the gate line, on the data line, on the source electrode, on the drain electrode, on the first common section, and on the second common section;

forming at least one through hole penetrating the passivation layer to partially expose the first common section and the second common section; and

forming a connection section on the passivation layer, wherein the connection section is electrically connected to the first common section and to the second common section exposed by the through hole.

10. The method of forming the display panel according to claim 9, wherein the gate line, the gate electrode, the at least one first common section, and the at least one second common section are made of a first patterned conducting layer, and the data line, the source electrode, and the drain electrode are made of a second patterned conducting layer, and wherein the at least one through hole comprises a first through hole and a second through hole, the first through hole partially exposes the first common section, and the second through hole partially exposes the second common section.

11. The method of forming the display panel according to claim 10, further comprising forming an insulated layer on the substrate and on the first patterned conducting layer prior to forming the passivation layer and the second patterned conducting layer, the first through hole penetrating the passivation layer and the insulated layer to partially expose the first common section, and the second through hole penetrating the passivation layer and the insulated layer to partially expose the second common section, wherein a sidewall of the insulated layer exposed by the first through hole and a sidewall of the insulated layer exposed by the second through hole respectively have a stair structure, and each of the stair structures comprises a first slanted surface, a flat surface, and a second slanted surface.

12. The method of forming the display panel according to claim 11, wherein the step of forming the at least one through hole comprises:

forming a patterned photo resist on the passivation layer, the patterned photo resist having an opening, a first area, and a second area, wherein the opening partially overlaps the first common section and the second common section in a vertical projection direction, the first area adjoins the opening and does not overlap the first common section and the second common section in the vertical projection direction, the second area surrounds the first area and the opening, and a thickness of the first area is thinner than a thickness of the second area; and

using the patterned photo resist as a mask to etch the passivation layer and the insulated layer to form the first through hole, the second through hole, and the stair structures of the insulated layer, wherein the patterned photo resist is formed by using a halftone mask or a gray scale mask.

13. The method of forming the display panel according to claim 9, wherein the gate line, the gate electrode, and the at least one first common section are made of a first patterned conducting layer, and wherein the data line, the source electrode, the drain electrode, and the at least one second common section are made of a second patterned conducting layer, and wherein the at least one first through hole comprises a first through hole and a second through hole, the at least one first common section comprises two first common sections, the at least one second common section comprises two second common sections, the first through hole partially exposes one of the two first common sections and one of the two second common sections, and the second through hole partially exposes the other of the two first common sections and the other of the second common sections.

14. The method of forming the display panel according to claim 13, further comprising forming an insulated layer on the substrate and on the first patterned conducting layer prior to forming the passivation layer and the second patterned conducting layer, the first through hole penetrating passivation layer and the insulated layer to partially expose one of the two first common sections and one of the two second common sections, and the second through hole penetrating the passivation layer and the insulated layer to partially expose the other of the two first common sections and the other of the two second common sections, wherein a sidewall of the insulated layer exposed by the first through hole and a sidewall of the insulated layer exposed by the second through hole respectively have a first slope, a sidewall of the second common section exposed by the first through hole and a sidewall of the second common section exposed by the second through hole respectively have a second slope, and the second slope is less than the first slope.

15. The method of forming the display panel according to claim 14, wherein the step of forming the at least one through hole comprises:

forming a patterned photo resist on the passivation layer, the patterned photo resist having an opening, a first area, and a second area, wherein the opening overlaps the two first common sections and does not overlap the two second common sections in a vertical projection direction, the first area adjoins the opening, overlaps the two second common sections, and does not overlap the two first common sections in the vertical projection direction, the second area surrounds the first area and the opening, and a thickness of the first area is thinner than a thickness of the second area; and

using the patterned photo resist as a mask to etch the passivation layer and the insulated layer to form the first through hole and the second through hole, wherein the patterned photo resist is formed by using a halftone mask or a gray scale mask.

16. The method of forming the display panel according to claim 9, wherein the connection section is made of a patterned transparent conducting layer, the patterned transparent conducting layer further comprises a pixel electrode, and the pixel electrode is electrically connected to the drain electrode and electrically separated from the connection section.

17. A common line structure, disposed on a substrate, the common line structure comprising:

at least one first common section, disposed on the substrate;

at least one second common section, disposed on the substrate;

a passivation layer, disposed on the at least one first common section and on the at least one second common section, wherein the passivation layer having at least one through hole, partially exposing the at least one first common section and the at least one second common section; and

a connection section, disposed on the passivation layer, wherein the connection section is electrically connected to the at least one first common section and to the at least one second common section exposed by the through hole.

18. The common line structure according to claim 17, wherein the first common section and the second section are made of a same patterned conducting layer, and wherein the at least one through hole comprises a first through hole and a second through hole, the first through hole partially exposes the first common section, and the second through hole partially exposes the second common section.

19. The common line structure according to claim 18, further comprising an insulated layer disposed between the first common section and the passivation layer, and between the first common section and the second common section, wherein the first through hole penetrates the passivation layer and the insulated layer to partially expose the first common section, and the second through hole penetrates the passivation layer and the insulated layer to partially expose the second common section, wherein a sidewall of the insulated layer exposed by the first through hole and a sidewall of the insulated layer exposed by the second through hole respectively have a stair structure, and each of the stair structures comprises a first slanted surface, a flat surface, and a second slanted surface.

20. The common line structure according to claim 17, wherein the first common section is made of a first patterned conducting layer and the second common section is made of a second patterned conducting layer, wherein the at least one first through hole comprises a first through hole and a second through hole, the at least one first common section comprises two first common sections, the at least one second common section comprises two second common sections, the first through hole partially exposes one of the two first common sections and one of the two second common sections, and the second through hole partially exposes the other of the two first common sections and the other of the two second common sections.

21. The common line structure according to claim 20, further comprising an insulated layer disposed between the two first common sections and the two second common sections, wherein the first through hole penetrates the passivation layer and the insulated layer to partially expose one of the two first common sections and one of the two second common sections, and the second through hole penetrates the passivation layer and the insulated layer to partially expose the other of the two first common sections and the other of the two second common section, wherein a sidewall of the insulated layer exposed by the first through hole and a sidewall of the insulated layer exposed by the second through hole respectively have a first slope, a sidewall of the second common section exposed by the first through hole and a sidewall of the second common section exposed by the second through hole respectively have a second slope, and the second slope is less than the first slope.

22. The common line structure according to claim 17, wherein the connection section is made of a patterned transparent conducting layer.

23. A display panel, comprising:

a substrate;

a gate line, a gate electrode, a data line, a source electrode, and a drain electrode disposed on the substrate;

a common line structure, disposed on the substrate, wherein the common line structure comprises at least one first common section and at leas one second common section;

a passivation layer, disposed on the gate line, on the gate electrode, on the data line, on the source electrode, on the drain electrode, on the first common section, and on the second common section, wherein the passivation layer has at least one through hole partially exposing the first common section and the second common section; and

a connection section, disposed on the passivation layer, wherein the connection section is electrically connected to the first common section and to the second common section exposed by the through hole.

24. The display panel according to claim 23, wherein the gate line, the gate electrode, the at least one first common section and the at least one second common section are made of a first patterned conducting layer, and the data line, the source electrode, and the drain electrode are made of a second patterned conducting layer, wherein the at least one through hole comprises a first through hole and a second through hole, the first through hole partially exposes the first common section, and the second through hole partially exposes the second common section.

25. The display panel according to claim 24, further comprising an insulated layer disposed between the first common section and the second common section, wherein the first through hole penetrates the passivation layer and the insulated layer to partially expose the first common section, and the second through hole penetrates the passivation layer and the insulated layer to partially expose the second common section, wherein a sidewall of the insulated layer exposed by the first through hole and a sidewall of the insulated layer exposed by the second through hole respectively have a stair structure, and each of the stair structures comprises a first slanted surface, a flat surface, and a second slanted surface.

26. The display panel according to claim 23, wherein the gate line, the gate electrode, and the at least one first common section are made of a first patterned conducting layer, and the data line, the source electrode, the drain electrode, and the second common section are made of a second patterned conducting layer, wherein the at least one through hole comprises a first through hole and a second through hole, the at least one first common section comprises two first common sections, the at least one second common section comprises two second common sections, the first through hole partially exposes one of the two first common sections and one of the two second common sections, and the second through partially exposes the other of the two first common sections and the other of the two second common sections.

27. The display panel according to claim 26, further comprising an insulated layer disposed between the two first common sections and the two second common sections, wherein the first through hole penetrates the passivation layer and the insulated layer to partially expose one of the two first common sections and one of the two second common sections, and the second through hole penetrates the passivation layer and the insulated layer to partially expose the other of the two first common sections and the other of the two second common sections, wherein a sidewall of the insulated layer exposed by the first through hole and a sidewall of the insulated layer exposed by the second through hole respectively have a first slope, a sidewall of the second common section exposed by the first through hole and a sidewall of the second common section exposed by the second through hole respectively have a second slope, and the second slope is less than the first slope.

28. The display panel according to claim 23, wherein the connection section is made of a patterned transparent conducting layer, the patterned transparent conducting layer further comprises a pixel electrode, and the pixel electrode is electrically connected to the drain electrode and electrically separated from the connection section.