METHOD AND APPARATUS FOR CORRECTING ERRORS OF A PHOTOLITHOGRAPHIC MASK
First Claim
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1. A method for correcting a plurality of errors of a photolithographic mask;
- the method comprising;
a. optimizing first parameters of an imaging transformation of the photolithographic mask and second parameters of a laser beam locally directed onto the photolithographic mask; and
b. correcting the plurality of errors by applying an imaging transformation using optimized first parameters and locally directing the laser beam onto the photolithographic mask using optimized second parameters;
c. wherein the first and the second parameters are simultaneously optimized in a joint optimization process.
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Abstract
A method for correcting a plurality of errors of a photolithographic mask, comprising optimizing first parameters of a imaging transformation of the photolithographic mask and second parameters of a laser beam locally directed onto the photolithographic mask, and correcting the plurality of errors by applying an imaging transformation using optimized first parameters and locally directing the laser beam onto the photolithographic mask using optimized second parameters, wherein the first and the second parameters are simultaneously optimized in a joint optimization process.
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21 Claims
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1. A method for correcting a plurality of errors of a photolithographic mask;
- the method comprising;
a. optimizing first parameters of an imaging transformation of the photolithographic mask and second parameters of a laser beam locally directed onto the photolithographic mask; and b. correcting the plurality of errors by applying an imaging transformation using optimized first parameters and locally directing the laser beam onto the photolithographic mask using optimized second parameters; c. wherein the first and the second parameters are simultaneously optimized in a joint optimization process. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 21)
- the method comprising;
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20. An apparatus for correcting a plurality of errors of a photolithographic mask, comprising:
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a. at least one computing means operable for simultaneously optimizing first parameters of an imaging transformation of the photolithographic mask and second parameters of a laser beam locally directed onto the photolithographic mask; b. at least one laser source for generating the laser beam of light pulses according to optimized second laser beam parameters; and c. at least one scanning means for performing an imaging transformation according to optimized first imaging parameters.
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Specification