META MATERIAL AND METHOD OF MANUFACTURING THE SAME

• US 20120013989A1
• Filed: 01/25/2011
• Published: 01/19/2012
• Est. Priority Date: 07/15/2010
• Status: Active Grant

• Current Assignee: Electronics and Telecommunications Research Institute
• Original Assignee: Electronics and Telecommunications Research Institute
• Inventors: CHOI, Choon Gi, Oh, Sang Soon
• Granted Patent: US 8,879,158 B2
• Time in Patent Office: Days
• US Class Current: 359/642
• CPC Class Codes: B82Y 20/00 Nanooptics, e.g. quantum optics or photonic crystals
• CPC Class Codes: G02B 1/007 made of negative effective refractive index materials
• CPC Class Codes: G02B 2207/101 Nanooptics
• CPC Class Codes: H01Q 15/0086 said selective devices having materials with a synthesized negative refractive index, e.g. metamaterials or left-handed materials

Abstract

Provided are a meta material and a method of manufacturing the same. The meta material comprises: a substrate; at least one conductive nano pattern patterned on the substrate and having a size with a negative refractive index in a predetermined electromagnetic wavelength band; and a dielectric layer covering the conductive nano patterns.

Claims

1. A meta material comprising:

a substrate;

at least one conductive nano pattern patterned on the substrate and having a size with a negative refractive index in a predetermined electromagnetic wavelength band; and

a dielectric layer covering the conductive nano patterns.

2. The meta material of claim 1, wherein the conductive nano patterns comprise graphene or a graphene oxide.

3. The meta material of claim 2, wherein the conductive nano patterns comprise at least one of silver, gold, aluminum, copper, and nickel.

4. The meta material of claim 1, wherein the conductive nano patterns are formed of at least one concentric ring in a parallel direction to the substrate.

5. The meta material of claim 4, wherein the concentric rings are arranged in a triangular grid or a rectangular grid in the parallel direction to the substrate.

6. The meta material of claim 5, wherein the concentric rings have the negative refractive index with respect to an electromagnetic wave of at least one single wavelength in a wavelength band of 400 nm to 650 nm when the concentric rings have a line width of 25 nm.

7. The meta material of claim 1, wherein

the dielectric layer is provided between the conductive nano patterns;

the conductive nano patterns and the dielectric layer are alternately stacked on the substrate; and

at least one hole penetrates the conductive nano patterns and the dielectric layer.

8. The meta material of claim 7, wherein the holes have at least one of a rectangular shape or a circular shape.

9. The meta material of claim 8, wherein the dielectric layer and the conductive nano pattern have thicknesses of 17 nm and 40 nm, respectively;

and

the holes of the rectangular shape have a width and a length of 60 nm and 90 nm each other, respectively; and

when the holes have a period of 300 nm, they have a negative refractive index with respect to an electromagnetic wave of a 670 nm wavelength band.

10. The meta material of claim 1, wherein the dielectric layer comprises an aluminum oxide layer, a silicon oxide layer, a titanium oxide layer, or a magnesium fluoride layer.

11. The meta material of claim 10, wherein as a dielectric constant or an original refractive index of the dielectric layer is lower, the dielectric constant or the original refractive index has a negative refractive index with respect to an electromagnetic wave of a short wavelength band.

12. A method of manufacturing a meta material, the method comprising:

preparing a substrate;

forming at least one conductive nano pattern having a negative refractive index on the substrate; and

forming a dielectric layer on the conductive nano patterns having a concentric ring shape.

13. The method of claim 12, wherein the conductive nano patterns comprise graphene formed using a chemical vapor deposition method or a graphene oxide formed using a graphite oxidation-reduction method.

14. The method of claim 12, wherein the conductive nano patterns are formed using a copolymerization soft patterning method.

15. The method of claim 14, wherein the copolymerization soft patterning method comprises:

forming a block copolymer on the substrate;

forming a photoresist pattern exposing the block copolymer;

selectively exposing the substrate using a self-assembly method of the block copolymer; and

forming the concentric ring shape with the graphene or the graphene oxide on the exposed substrate.

16. The method of claim 15, wherein the block copolymer is polystyrene(PS)-random-polymethylmethacrylate(PMMA) comprising PS and PMMA.

17. The method of claim 16, wherein the self-assembly method of the block copolymer comprises:

arranging the PS and the PMMA of the block copolymer on the substrate, with the concentric ring shape; and

exposing the substrate by removing the PMMA of the block copolymer.

18. A method of manufacturing a meta material, the method comprising:

alternately stacking conductive layers and a dielectric layer on a substrate; and

forming at least one hole penetrating the dielectric layer and the conductive layers by patterning the dielectric layer and the conductive layers.

19. The method of claim 18, wherein the conductive layers comprise graphene formed using a chemical vapor deposition method or a graphene oxide formed using a graphite oxidation-reduction method.

20. The method of claim 18, wherein the holes are formed using a focused ion beam or a reactive ion etching method.