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EXHAUST FOR CVD REACTOR

  • US 20120027936A1
  • Filed: 08/02/2010
  • Published: 02/02/2012
  • Est. Priority Date: 08/02/2010
  • Status: Active Grant
First Claim
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1. A chemical vapor deposition reactor comprising:

  • (a) a reaction chamber having an interior;

    (b) a gas inlet manifold communicating with the interior of the chamber for admitting process gasses to form a deposit on substrates held within the interior;

    (c) an exhaust system including an exhaust manifold having a passage and one or more ports, the passage communicating with the interior of the chamber through the one or more ports; and

    (d) one or more cleaning elements mounted within the chamber, the one or more cleaning elements being movable between (i) a run position in which the cleaning elements are remote from the one or more ports and (ii) a cleaning position in which the one or more cleaning elements are engaged in the one or more ports.

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