Method of Continuously Measuring Substrate Concentration
First Claim
1. A method of continuously measuring a substrate concentration based on a response when a voltage is applied to a sensor, comprising:
- a response voltage application step of applying a response voltage at which a response attributed to a substrate is obtained; and
a non-response voltage application step of applying a non-response voltage at which the response attributed to the substrate is not obtained or is not substantially obtained.
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Accused Products
Abstract
Analysis equipment is provided, which is capable of fulfilling a demand for miniaturization and ensuring high sensitivity, and which can be produced easily. The present invention relates to a method of continuously measuring a substrate concentration based on a response when a voltage is applied to a sensor. The present invention includes a response voltage application step of applying a response voltage E2 at which a response attributed to a substrate is obtained and a non-response voltage application step of applying a non-response voltage E1 at which the response attributed to the substrate is not obtained or is not substantially obtained. Preferably, the response voltage application step and the non-response voltage application step are repeated alternately.
7 Citations
11 Claims
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1. A method of continuously measuring a substrate concentration based on a response when a voltage is applied to a sensor, comprising:
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a response voltage application step of applying a response voltage at which a response attributed to a substrate is obtained; and a non-response voltage application step of applying a non-response voltage at which the response attributed to the substrate is not obtained or is not substantially obtained. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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Specification